Isolated Alignment Mark for Display Substrate Aperture Ratio
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Solution Overview
Problem
In liquid crystal display panels, achieving high aperture ratio while maintaining process margin is challenging due to difficulties in aligning drain lines with structural elements, which affects luminance and increases costs.
Innovation Solution
A substrate with an isolated alignment accuracy measurement mark allows for precise alignment measurement without electrical connection, eliminating the need for linear sections in conductor patterns, thereby improving aperture ratio without reducing process margin.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If a linear section is formed in the drain line for alignment accuracy measurement, then alignment accuracy can be measured, but the aperture ratio of the pixel decreases
Solution Approach 1:
The measurement mark is segmented from the drain line structure, forming an isolated configuration that is electrically disconnected from the conductive elements. This allows the measurement mark to be positioned independently without occupying functional pixel area, thus maintaining aperture ratio while enabling alignment measurement.
Solution Approach 2:
An isolated measurement mark serves as an intermediary element that enables alignment accuracy measurement without being part of the functional conductive patterns. The mark acts as a dedicated measurement reference that does not interfere with the electrical function of the drain line or reduce the pixel aperture.
2Area of stationary object
If the widths of the drain line sections are narrowed to increase aperture ratio, then aperture ratio improves, but process margin decreases
Solution Approach 1:
By segmenting the measurement function from the drain line structure, the drain line can maintain its standard width throughout, preserving process margin while still enabling aperture ratio optimization through proper positioning of the isolated measurement mark.
3Area of stationary object
If the drain line is arranged to coincide with structural elements, then aperture ratio increases, but alignment accuracy measurement becomes difficult
Solution Approach 1:
The measurement function is extracted from the drain line structure and placed in an isolated configuration. This allows the drain line to be optimally positioned to coincide with structural elements for maximum aperture ratio, while the separate measurement mark provides dedicated alignment measurement capability.
4Measurement precision
If a linear section is formed in the drain line for measurement, then alignment accuracy can be measured, but design freedom decreases
Solution Approach 1:
The isolated measurement mark is segmented from the functional conductive patterns, allowing independent optimization of both the drain line configuration and the measurement mark position. This provides design freedom to arrange the drain line for optimal aperture ratio while maintaining dedicated measurement capability.
Data Source
AI summary
A substrate for a display panel includes an alignment accuracy measurement mark which is used for measuring alignment accuracy between patterns on the substrate without decreasing an aperture ratio of a pixel. The substrate for a display panel includes the alignment accuracy measurement mark in an isolated configuration which is used for measuring alignment accuracy between a pattern of a gate signal line and an auxiliary capacitance line and a pattern of a source signal line and a drain line, where the alignment accuracy measurement mark has a shape such that at least one straight line portion is included, is formed in a layer where the pattern of the source signal line and the drain line is formed, and is positioned on the gate signal line.