Thermally Isolated Rotary Table Stages for Deposition Uniformity
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Solution Overview
Problem
Existing deposition apparatuses face challenges in efficiently and uniformly depositing films onto substrates while minimizing film deposition on the rotary table and reducing particle generation, thermal non-uniformity, and energy consumption.
Innovation Solution
A deposition apparatus with a rotary table and stages thermally isolated from each other, featuring a coolant flow channel for cooling the rotary table and a separation region to prevent gas mixing, ensuring precise control of gas flow and temperature for uniform film deposition on substrates while suppressing film deposition on the rotary table.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Object-generated harmful factors
If the rotary table is heated during deposition, then film deposition on the rotary table is suppressed, but this causes thermal non-uniformity and increases energy consumption
Solution Approach 1:
The system segments the thermal control by providing individual heating means for each stage rather than heating the entire rotary table. This allows localized heating only where substrates are present, suppressing film deposition on the rotary table while minimizing energy consumption and thermal non-uniformity.
Solution Approach 2:
The heating means are configured to provide localized heating to each stage individually. This creates local thermal quality where heat is applied only to stages with substrates, preventing film deposition on the rotary table surface while avoiding unnecessary energy consumption in regions without substrates.
2Productivity
If multiple stages are provided on the rotary table, then productivity is improved, but thermal isolation between stages becomes difficult to maintain
Solution Approach 1:
The rotary table is divided into multiple independent stages, each with its own heating means. This segmentation allows each stage to be thermally isolated and controlled independently, maintaining film uniformity across multiple substrates while improving productivity through parallel processing.
Solution Approach 2:
Thermal insulation structures are provided between adjacent stages to act as thermal intermediaries. These structures prevent heat transfer between stages, ensuring thermal isolation is maintained even when multiple stages are closely arranged on the rotary table, thus preserving film uniformity while enabling high productivity.
3Manufacturing precision
If the rotary table rotates at high speed, then deposition uniformity is improved, but particle generation increases
Solution Approach 1:
The system performs preliminary heating of each stage before substrate deposition begins. This pre-heating ensures that stages are at the appropriate temperature prior to deposition, allowing for stable high-speed rotation that achieves uniform film thickness without generating particles from thermal fluctuations or improper heating conditions.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration enhances film uniformity, reduces particle generation, minimizes energy consumption, and improves step coverage and film thickness uniformity on patterned substrates, while also reducing the frequency of rotary table replacement.
Implementation Method 1
a rotary table rotatably provided in the processing chamber and including a coolant flow channel therein
Implementation Method 2
a heater configured to heat the substrate mounted on each of the stages
Implementation Method 3
The stages are supported by the rotary table while being thermally isolated from the rotary table
Data Source
AI summary
A deposition apparatus includes a processing chamber, a rotary table rotatably provided in the processing chamber and including a coolant flow channel therein, a plurality of stages provided along a rotation direction of the rotary table and each configured to mount a substrate thereon, and a heater configured to heat the substrate mounted on each of the stages. The stages are supported by the rotary table while being thermally isolated from the rotary table.