Isolating Spacer Aperture Design for Electron Beam Discharge Control
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Solution Overview
Problem
Existing electron-optical devices face issues with stray electromagnetic fields diverting charged particle beams, leading to electron creep and electrical discharges, which degrade image quality and throughput in semiconductor manufacturing.
Innovation Solution
An isolating spacer is introduced between upbeam and downbeam charged particle-optical elements, featuring protruding portions to create a larger aperture dimension at the intermediate portion, effectively isolating and controlling the elements to prevent electron creep and discharges.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Power
If high voltage is applied to electrodes in electron-optical devices, then beam control capability is improved, but electron creep and electrical discharge occur leading to reduced reliability
Solution Approach 1:
The patent introduces an isolating spacer as an intermediary component positioned between the upbeam and downbeam charged particle-optical elements. This spacer physically separates the high-voltage electrodes, preventing direct electrical discharge paths while allowing the high voltage to be applied for effective beam control. The spacer acts as a mediator that enables high voltage operation without the harmful electrical breakdown effects.
Solution Approach 2:
The patent divides the charged particle-optical assembly into separate upbeam and downbeam sections using the isolating spacer. This segmentation isolates the high-voltage regions from each other, preventing electron creep between adjacent electrodes while maintaining the necessary voltage gradients for beam manipulation in each section.
2Reliability
If isolating spacer is introduced to prevent electron creep, then reliability is improved, but device complexity increases
Solution Approach 1:
The isolating spacer serves multiple functions simultaneously: it provides electrical isolation between upbeam and downbeam elements, mechanically supports the charged particle-optical components, defines the spacer aperture for beam passage, and creates the protruding portions that increase aperture dimension. This multi-functionality reduces the need for additional separate components, thereby limiting the increase in device complexity.
3Stability of the object's composition
If spacer aperture dimension is increased at intermediate portion, then beam path stability is improved, but manufacturing precision requirements increase
Solution Approach 1:
The isolating spacer features local quality variations with different aperture dimensions at different positions: a larger dimension at the intermediate portion for beam path stability and smaller dimensions at the upbeam and downbeam portions for precise electrode positioning. This localized dimensional variation optimizes both beam stability and manufacturing feasibility by concentrating precision requirements at critical locations.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution enhances the stability of charged particle beams, reducing aberrations and improving image quality while maintaining high throughput in multi-beam inspection systems.
Implementation Method 1
the isolating spacer configured to electrically isolate the upbeam charged particle-optical element and the downbeam charged particle-optical element from each other
Implementation Method 2
Stray electromagnetic fields can undesirably divert the beam. In some electron-optical devices an electrostatic field is typically generated between two electrodes.
Data Source
AI summary
A charged particle-optical assembly manipulates one or more charged particle beams. The assembly includes: an upbeam element, a downbeam element and an isolating spacer. The upbeam and down beam elements each include a plate having one or more apertures around a beam path of one or more charged particle beams. The spacer is for electrically isolating the upbeam element and the element from each other. The spacer defines a spacer aperture around the beam path of the one or more charged particle beams. The spacer includes an upbeam portion adjacent to the upbeam element, a downbeam portion adjacent to the downbeam element and an intermediate portion between the upbeam and downbeam portions. The upbeam portion and the downbeam portion protrude relative to the intermediate portion so the spacer aperture has an increased dimension at the intermediate portion compared to the upbeam and downbeam portions.