Display Panel Isolation Ring Drainage Structure for Gas Trapping
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Solution Overview
Problem
The existing display panel manufacturing process faces issues with gas trapped in undercut areas during the HVCD and Soft-Bake processes, leading to bubbling and bursting of the photoresist layer, which affects the formation of display elements like OLEDs, resulting in defects.
Innovation Solution
Incorporating a drainage structure extending from the sidewall of isolation rings along a straight line passing through their center, allowing for smooth discharge of gas during these processes and preventing bubbling and bursting of the photoresist layer.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Strength
If isolation rings are formed with undercut areas during manufacturing, then the isolation structure provides better mechanical support and definition, but gas becomes trapped during HVCD and Soft-Bake processes causing bubbling and bursting of the photoresist layer
Solution Approach 1:
The patent extracts the harmful gas from the undercut areas by providing drainage structures that extend from the isolation rings toward the opening area. These drainage structures create escape pathways that allow trapped gas to be removed during the HVCD and Soft-Bake processes, preventing the gas from causing bubbling and bursting of the photoresist layer while maintaining the undercut structure's mechanical support function
Solution Approach 2:
The drainage structures serve as intermediary elements between the undercut areas and the external environment. They mediate the gas removal process by providing controlled pathways for gas escape, enabling the undercut isolation rings to maintain their structural integrity while preventing gas accumulation that would otherwise damage the photoresist layer
2Ease of manufacture
If gas is trapped in undercut areas during HVCD and Soft-Bake processes, then the manufacturing process can proceed with standard isolation ring structures, but the photoresist layer experiences bubbling and bursting leading to display element defects
Solution Approach 1:
The patent applies preliminary action by incorporating drainage structures into the isolation ring design before the photoresist coating and subsequent processing steps. This pre-configured gas escape pathway ensures that when the HVCD and Soft-Bake processes are performed, gas can be removed without causing defects, thereby maintaining both manufacturing simplicity and display element pattern accuracy
3Reliability
If drainage structures are added to isolation rings, then gas can be discharged effectively preventing photoresist layer defects, but the isolation ring structure becomes more complex
Solution Approach 1:
The patent applies local quality by adding drainage structures only in specific locations where gas accumulation occurs - namely, extending from the isolation rings toward the opening area. This localized modification provides the necessary gas escape pathways without requiring complete redesign of the entire isolation ring structure, thus maintaining photoresist layer integrity while minimizing overall structural complexity
Data Source
AI summary
A display panel and an electronic device are provided. The display panel includes: an opening area; a display area surrounding the opening area; at least one isolation ring, wherein at least a part of the at least one isolation ring is located between the display area and the opening area, and the at least one isolation ring surrounds the opening area; and a drainage structure extending from a sidewall of an isolation ring in the at least one isolation ring along a straight line passing through a center of the isolation ring.