Free Space Isolator Buffer Area via Asymmetric Polarizer Mark
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Conventional free space isolators require increased size to provide a larger buffer area for optical beams, leading to higher costs, whereas existing designs struggle to maintain a sufficient buffer without enlarging the device's dimensions.
Innovation Solution
A free space isolator design featuring a sandwich-type optical wafer with a 0-degree polarizer as the incident plane, a Faraday rotator, and a 45-degree polarizer with a mark on its edge, allowing the buffer area to be enlarged by reducing the peripheral area of the outgoing polarizer without increasing the overall device size.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Area of stationary object
If the size of the free space isolator is increased to provide a larger buffer area for optical beams, then the buffer area is improved, but the manufacturing cost increases
Solution Approach 1:
The patent applies asymmetry by placing the mark on the outgoing polarizer (second polarizer) rather than the incident polarizer (first polarizer). This asymmetric positioning creates a buffer area on the incident polarizer side without requiring an increase in the overall device size. The mark on the outgoing polarizer reduces its effective area, which indirectly provides buffer space on the opposite side where the incident beam enters, thus resolving the contradiction between buffer area and device size/cost.
Solution Approach 2:
The patent utilizes the dimensional relationship between the two polarizers in the optical path. By manipulating the mark position on the outgoing polarizer, the design effectively creates buffer space in the incident polarizer's area without increasing the overall footprint of the device. This dimensional manipulation allows the buffer area to be optimized independently of the device's external dimensions.
2Area of stationary object
If the size of the free space isolator is increased to provide a larger buffer area for optical beams, then the buffer area is improved, but the device size increases
Solution Approach 1:
The asymmetric placement of the mark on the outgoing polarizer creates a buffer area on the incident polarizer side without increasing the overall device dimensions. This asymmetric design allows the buffer area to be enlarged while maintaining the same external size of the isolator, directly resolving the contradiction between buffer area and device size.
Solution Approach 2:
The patent exploits the spatial relationship between the incident and outgoing polarizers to create buffer space in one area without increasing the device's external dimensions. By reducing the effective area of the outgoing polarizer through the mark, buffer space is created in the incident polarizer region, achieving larger buffer area within the same device footprint.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This design effectively increases the buffer area for optical beams without increasing the size of the free space isolator, thereby reducing manufacturing costs while maintaining effective beam containment and alignment.
Implementation Method 1
a Faraday rotator configured to rotate the polarized light by a predetermined angle
Implementation Method 2
the first polarizer may also polarize or align the optical (e.g., light) beam(s)
Data Source
AI summary
An optical isolator capable of creating a larger safe buffer area for optical beam(s) and a manufacturing method thereof are disclosed. The optical isolator includes a sandwich type wafer, a first polarizer, a Faraday rotator and a second polarizer. The first polarizer works as the incident plane of the FSI (free space isolator), while the second polarizer works as the outgoing plane of the FSI. The direction in which the second polarizer passes the polarized beam is at a 45° angle with respect to the first polarizer. The manufacturing method includes marking the edge of the second polarizer. FSIs processed by this method provide a larger buffer area for the optical beam(s) and/or a lower manufacturing cost, even though the size of the FSI is unchanged.