Jet-Mixed Vaporization for Uniform Boron Diffusion Steam Control
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Solution Overview
Problem
The existing vaporization systems for boron diffusion processes in silicon wafers face challenges in controlling the flow rate of deionized water steam, leading to non-uniform oxidation treatment and subsequent boron diffusion reactions.
Innovation Solution
A vaporization system incorporating a jet mixer and mixing heater to form a mist-like mixture of carrier gas and process liquid, followed by heating to vaporize it into steam, with controlled flow rates using various valves and controllers to ensure uniform steam distribution to process chambers.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a traditional bubbling method with quartz bottle and preheater is used to generate steam, then the system structure is simple, but the flow rate of deionized water steam is difficult to control and uniformity of oxidation treatment is reduced
Solution Approach 1:
The patent changes the physical state parameters by introducing carrier gas to form a mist-like mixture, which improves vaporization efficiency and flow rate control. The jet mixer creates fine droplets that vaporize more uniformly, directly addressing the uniformity issue while maintaining reasonable system complexity
Solution Approach 2:
The patent replaces the traditional mechanical preheating system with a jet mixing system that uses fluid dynamics to atomize the process liquid. This substitution enables better control over steam generation and flow rate, improving manufacturing precision without significantly increasing device complexity
2Reliability
If deionized water steam is used to oxidize silicon wafer, then the oxidation treatment can be performed, but the flow rate of steam cannot be effectively controlled affecting boron diffusion uniformity
Solution Approach 1:
The patent implements flow rate controllers that monitor and adjust the carrier gas and process liquid flow rates in real-time. This feedback mechanism ensures precise control over steam generation, which directly improves the uniformity of boron diffusion by maintaining consistent steam flow to the process chamber
Solution Approach 2:
The patent uses pneumatic control through carrier gas flow to regulate steam generation. The jet mixer utilizes gas flow dynamics to atomize the process liquid, and flow rate controllers precisely manage the gas and liquid inputs, enabling reliable and precise steam flow control that ensures uniform boron diffusion across wafers
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The system ensures precise control over steam flow rates and uniformity, enhancing the efficiency and uniformity of boron diffusion processes across multiple wafers.
Implementation Method 1
the jet mixer is configured to mix the carrier gas input from the gas source with the process liquid input from the process liquid source to form a mist-like mixture
Implementation Method 2
the mixing heater is configured to heat the mist-like mixture to vaporize the mist-like mixture into the steam
Implementation Method 3
the mixing heater is configured to heat the mist-like mixture to vaporize the mist-like mixture into the steam
Data Source
AI summary
The present disclosure provides a vaporization system and semiconductor process equipment. The vaporization system includes a jet mixer, a mixing heater, a process liquid source, and a plurality of pipelines. The process liquid source is configured to store and output process liquid. Two inlets of the jet mixer communicate with an external gas source and the process liquid source, respectively. The first inlet of the jet mixer communicates with the gas source through a gas inlet pipeline, and a second inlet of the jet mixer communicates with the process liquid source through the liquid inlet pipeline. The jet mixer is configured to mix the carrier gas transferred from the gas source with the process liquid transferred from the process liquid source to form a mist-like mixture. The inlet of the mixing heater communicates with the outlet of the jet mixer.