Jetting Device Vacuum Nozzle Residue Control

The vacuum ejector system is integrated with the jetting nozzle assembly, combining the droplet ejection function and residue removal function into a single coordinated system. The vacuum nozzle is positioned to work in conjunction with the jetting nozzle, allowing simultaneous or sequential operation without requiring separate independent systems.

A gaseous flow is introduced as an intermediary medium to transport viscous medium residue from the jetting outlet. The gas flow acts as a carrier that entrains the residue and moves it through the vacuum nozzle to the ejector, eliminating the need for direct mechanical contact or complex scraping mechanisms.

The inlet conduit diameter is made variable rather than fixed, allowing the system to dynamically adjust the flow cross-section based on operational requirements. The conduit can transition between different diameter states to optimize both precision control and flow capacity as needed.

The physical parameter of the inlet conduit (diameter) is changed to control flow characteristics. By varying the diameter, the system can precisely regulate the gaseous flow rate while maintaining sufficient flow capacity when the diameter is increased.

The vacuum ejector system is activated before or during the jetting process to prevent residue accumulation in the first place. By continuously or periodically removing residue, the system maintains optimal jetting conditions without requiring complex mechanical cleaning mechanisms.

The gaseous flow that could potentially interfere with droplet jetting is converted into a beneficial cleaning mechanism. The same gas flow that passes over the jetting outlet serves dual purposes: it can assist in droplet formation while simultaneously entraining and removing viscous medium residue.