Surrounding-Gate JLFET Channel Doping for Better Turn-Off

Resolve Bottlenecks,
Find Innovative Solutions
Generate Solutions

Solution Overview

Problem

Conventional junctionless field effect transistors (JLFETs) face difficulties in turning off and have a poor turn-off effect due to the same doping type in the channel and source/drain regions, leading to leakage current in the off state, which increases power consumption and fabrication complexity.

Innovation Solution

A semiconductor device with a channel region comprising a peripheral portion and a central portion, where the source/drain region and peripheral portion have a first doping type, and the central portion has a second doping type, narrowing the effective migration region and increasing the energy of the conduction and valence bands to improve the turn-off effect, eliminating the need for reverse bias voltage or metal gate work function adjustments.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Ease of manufacture

If the channel region and source/drain region have the same doping type in a conventional JLFET, then the implementation process is simpler and thermal budget is less restricted, but the device has greater difficulty in turning off and poorer turn-off effect

Engineering Contradiction:
Improveimplementation process simplicityVSAvoidturn-off effect
Core Design Contradiction:
Ease of manufactureVSReliability

Solution Approach 1:

The channel region is divided into a first doping region (same doping type as source/drain) and a second doping region (different doping type). This local differentiation allows the device to maintain simple manufacturing processes while improving turn-off characteristics through the presence of the differently-doped region that facilitates better carrier control and reduced off-state current.

Inventive Principle:
Principle #3Local quality

2Length of moving object

If the source-drain distance continues to shrink in traditional JFET, then the device dimension is reduced, but a short-channel effect is caused

Engineering Contradiction:
Improvesource-drain distanceVSAvoidshort-channel effect
Core Design Contradiction:
Length of moving objectVSReliability

Solution Approach 1:

The invention changes the doping type parameter in the channel region by introducing a second doping region with a doping type different from the source/drain regions. This parameter change effectively suppresses the short-channel effect, allowing the device to maintain proper electrical characteristics even with reduced source-drain distance.

Inventive Principle:
Principle #35Parameter changes

3Device complexity

If a conventional JLFET structure is used, then the fabrication process is simpler, but off-state leakage current increases and power consumption increases

Engineering Contradiction:
Improvefabrication process complexityVSAvoidpower consumption
Core Design Contradiction:
Device complexityVSLoss of energy

Solution Approach 1:

By introducing a second doping region with different doping type within the channel, the invention creates a localized structural modification that reduces off-state leakage current without requiring complete restructuring of the device. This approach maintains relatively simple fabrication processes while significantly improving power consumption characteristics.

Inventive Principle:
Principle #3Local quality

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The solution reduces off-state current, enhances the turn-off effect, and decreases power consumption and fabrication complexity by narrowing the effective migration region and increasing the energy bands, thereby improving the semiconductor device's performance.

Implementation Method 1

A doping concentration gradient of the JLFET is gentler... the channel region includes a peripheral portion and a central portion, the source/drain region and the peripheral portion have a first doping type, and the central portion has a second doping type

Methodology Applied
Scientific EffectDoping concentration gradient: Diffusion

Data Source

PatentUS20240063256A1Semiconductor device and method for fabricating same
Publication Date: 2024.02.22 CHANGXIN MEMORY TECH INC
  • US20240063256A1 patent drawing
  • US20240063256A1 patent drawing
  • US20240063256A1 patent drawing

AI summary

Embodiments relate to the field of semiconductors, and provide a semiconductor device and a method for manufacturing the same. The semiconductor device includes: an active pillar including a channel region and a source/drain region arranged on two sides of the channel region; and a gate structure surrounding at least part of the channel region. The channel region includes a peripheral portion and a central portion, the peripheral portion is positioned between the gate structure and the central portion, the source/drain region and the peripheral portion have a first doping type, and the central portion has a second doping type, where the first doping type is one of N-type and P-type, and the second doping type is other one of the N-type and the P-type. At least problems of greater difficulty in turning off existing junctionless field effect transistor and poorer turn-off effect may be solved.