Knurled PVD Target Surface for Stable Plasma Ignition

Resolve Bottlenecks,
Find Innovative Solutions
Generate Solutions

Solution Overview

Problem

PVD processes face challenges with insufficient secondary electron generation leading to plasma ignition failures, particularly in complex targets with varying grain sizes and impurities, resulting in frequent ignition retries and inefficiencies.

Innovation Solution

A PVD target structure featuring a knurled profile on its surface, specifically designed to enhance secondary electron production through mechanical machining, utilizing knurling to create a distinctive pattern of concave and convex structures that act as sharp objects to induce point discharge and stabilize plasma.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If a conventional smooth PVD target surface is used, then the manufacturing process is simple, but secondary electron generation is insufficient leading to plasma ignition failures

Engineering Contradiction:
Improveplasma ignition stabilityVSAvoidtarget surface structure
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The patent applies knurled profiles to specific regions (edge regions or entire surface) of the PVD target rather than uniformly modifying the entire target. This localized surface modification creates pointed structures in specific areas to enhance secondary electron generation where most needed for plasma ignition, while maintaining simpler geometry in other regions.

Inventive Principle:
Principle #3Local quality

Solution Approach 2:

The knurled profile introduces curved and pointed surface features instead of a flat smooth surface. The concave-convex pattern creates multiple small curved surfaces that concentrate electric field lines at their peaks, enhancing electron emission and plasma ignition reliability.

Inventive Principle:
Principle #14Spheroidality (Curvature)

2Reliability

If the PVD target has varying grain sizes and impurities, then the target can be made from conventional materials, but secondary electron generation remains insufficient causing frequent ignition retries

Engineering Contradiction:
Improveignition success rateVSAvoidignition retry frequency
Core Design Contradiction:
ReliabilityVSProductivity

Solution Approach 1:

The patent changes the physical parameter of the target surface by introducing knurled profiles with specific geometric characteristics (concave-convex patterns, pointed structures). This geometric parameter change enhances the electric field concentration and secondary electron emission, compensating for material imperfections like grain size variations and impurities.

Inventive Principle:
Principle #35Parameter changes

3Reliability

If a knurled profile is applied to the PVD target surface, then secondary electron generation increases improving plasma ignition, but the manufacturing process becomes more complex

Engineering Contradiction:
Improvesecondary electron generationVSAvoidtarget fabrication process
Core Design Contradiction:
ReliabilityVSEase of manufacture

Solution Approach 1:

The knurled profile is formed on the PVD target surface before the actual PVD deposition process. This preliminary surface preparation ensures that the secondary electron enhancement structure is already in place, allowing the target to be manufactured once with the desired geometry rather than requiring post-processing or complex assembly steps.

Inventive Principle:
Principle #10Preliminary action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The knurled profile significantly increases secondary electron generation, reducing plasma ignition failures and enhancing the efficiency and stability of the PVD process.

Implementation Method 1

utilizing knurling to create a distinctive pattern of concave and convex structures that act as sharp objects to induce point discharge and stabilize plasma

Methodology Applied
Scientific EffectPoint discharge: Corona Discharge

Data Source

PatentUS12559833B2PVD target structure and method for preparing the same
Publication Date: 2026.02.24 TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD
  • US12559833B2 patent drawing
  • US12559833B2 patent drawing
  • US12559833B2 patent drawing

AI summary

A PVD target structure is provided. The PVD target structure includes a target body having a first side and a second side opposite to the first side. The first side of the target body includes a first region and a second region surrounding the first region. The second region comprises a knurled profile. A method for preparing PVD target structure is also provided.