Lactone-Resist Composition for Organic Solvent Pattern Formation
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Current methods for forming patterns in semiconductor and photofabrication lithography processes face challenges in achieving high comprehensive performance due to varying conditions in development and rinse operations, particularly with organic-solvent-based developers, requiring a resist composition adaptable to diverse conditions.
Innovation Solution
A method involving an actinic-ray- or radiation-sensitive resin composition with a resin containing lactone structures and a compound that generates acid upon exposure, used in conjunction with a developer and rinse liquid, to form a negative pattern, enhancing adaptability and performance across different conditions.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a resist composition is optimized for specific development and rinse conditions, then pattern formation performance is improved under those conditions, but adaptability to various conditions deteriorates
Solution Approach 1:
The resist composition is designed to function effectively across multiple development and rinse conditions by incorporating a resin with specific lactone structures that provide consistent performance regardless of the organic solvent used or process parameters applied, making the composition universally adaptable
Solution Approach 2:
The invention changes the chemical structure parameters of the resin by incorporating specific lactone structures (formula 1) that respond predictably to acid generation during exposure, enabling the resist to maintain performance across varying development and rinse conditions through controlled chemical reactions
2Adaptability or versatility
If various conditions are used in development and rinse operations, then production flexibility is improved, but achieving high comprehensive performance deteriorates
Solution Approach 1:
The resist composition provides universal performance across diverse production conditions by using a resin with lactone structures that consistently respond to acid generation, ensuring high comprehensive performance whether using aqueous or organic developers, or varying rinse conditions
3Productivity
If an organic-solvent-based developer is used, then development effectiveness is improved, but finding appropriate combinations of resist composition and process conditions becomes more difficult
Solution Approach 1:
The invention changes the chemical response mechanism by using acid-generated solubility changes in lactone-containing resins, which provides predictable and consistent development effectiveness with organic solvents without requiring complex optimization of composition and condition parameters
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The method provides a resist composition that is versatile and adaptable to various development and rinse operations, ensuring wide production latitude and improved performance in pattern formation.
Implementation Method 1
a compound that when exposed to actinic rays or radiation, generates an acid
Data Source
AI summary
A method of forming a pattern includes (a) forming a film of an actinic-ray- or radiation-sensitive resin composition, (b) exposing the film to light, and (c) developing the exposed film with a developer comprising an organic solvent to thereby form a negative pattern. The actinic-ray- or radiation-sensitive resin composition includes (A) a resin whose solubility in the developer comprising an organic solvent is lowered when acted on by an acid, which resin contains a repeating unit with any of lactone structures of general formula (1) below, and (B) a compound that when exposed to actinic rays or radiation, generates an acid.