Laminar Flow Particle Shield for Semiconductor Optical Path
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Solution Overview
Problem
In semiconductor manufacturing, particularly in photolithography, particles and contaminants in the optical path of light passing through the photomask degrade pattern quality and adhere to surfaces, reducing precision and manufacturing yield.
Innovation Solution
A particle shield apparatus is generated using a combination of gas injectors and extractors, forming a laminar flow or magnetic field to prevent particles from reaching sensitive surfaces, thereby maintaining a clean optical path and enhancing precision.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a cleaning solvent is sprayed on surfaces to remove particles, then particle removal effectiveness is improved, but manufacturing process time and complexity increase
Solution Approach 1:
The particle shield is installed on wafer transportation and storage pads before manufacturing processes begin, preventing particle accumulation in the first place. This preliminary protective action eliminates the need for subsequent cleaning operations, resolving the contradiction between particle removal effectiveness and manufacturing process time
Solution Approach 2:
A gas flow intermediary is introduced between particle sources and sensitive surfaces to create a protective barrier. This gas curtain acts as a mediator that prevents particles from reaching critical areas during transportation and processing, eliminating the need for solvent cleaning while maintaining particle-free environments
2Object-affected harmful factors
If a solid shield is installed on wafer transportation pads, then particle contamination is reduced, but device complexity and space requirements increase
Solution Approach 1:
The patent replaces solid mechanical shields with a pneumatic gas flow barrier. Gas is delivered through nozzles to create a flowing curtain that prevents particle contamination without requiring physical barriers. This reduces device complexity by eliminating solid shield structures while maintaining protection effectiveness
Solution Approach 2:
The invention changes the state of the protective medium from solid (physical shields) to gaseous (flowing gas curtain). This parameter change allows the protective function to be achieved with simpler, more flexible components that adapt to various transportation pad configurations without adding mechanical complexity
3Object-affected harmful factors
If manual cleaning of clothing and equipment is performed, then particle introduction is reduced, but labor requirements and process time increase
Solution Approach 1:
The gas flow particle shields are integrated into the automated wafer transportation and handling systems, enabling the equipment to protect itself from particle contamination without requiring manual cleaning interventions. The system self-maintains a particle-free environment through continuous gas flow, eliminating labor-intensive cleaning operations and preserving manufacturing productivity
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The particle shield effectively prevents contaminants from adhering to surfaces and optical paths, improving pattern transfer quality and manufacturing yield by maintaining a clean environment.
Implementation Method 1
The injection nozzle and the suction nozzle are operable to form a laminar flow for blocking particles from contacting a proximate surface of an object
Implementation Method 2
The suction nozzle is configured to provide a gas pressure gradient for the laminar flow
Data Source
AI summary
An apparatus for generating a laminar flow includes an injection nozzle and a suction nozzle. The injection nozzle and the suction nozzle are operable to form the laminar flow for blocking particles from contacting a proximate surface of an object. The injection nozzle includes a main outlet to blow out the laminar flow. The injection nozzle is configured to generate a Coanda flow along an external surface of the injection nozzle. The suction nozzle is configured to provide a gas pressure gradient for the laminar flow.