Laminated Film Patterning for Display Device Manufacturing
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Solution Overview
Problem
The existing manufacturing processes for display devices, particularly those using photolithography, require multiple photomasks and photoresist materials, leading to increased costs and complexity due to the need for separate patterning of each layer in flat panel displays like organic EL displays.
Innovation Solution
A manufacturing method that forms a laminated film with multiple layers patterned together using photolithography techniques, including a gate electrode, semiconductor layer, source/drain electrode, planarizing film, and pixel isolation film, followed by the formation of a functional layer with an organic electric field light-emitting layer and a common electrode, reducing the number of photomasks and photoresist materials needed.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If separate photolithography processes are used for each layer (TFT, capacitive element, pixel electrode, pixel isolation film), then each layer can be precisely patterned, but the number of photomasks and photoresist materials increases, leading to higher cost and process complexity
Solution Approach 1:
The patent combines multiple photolithography processes into a single integrated process. Specifically, the pixel electrode pattern and pixel isolation film pattern are formed simultaneously using one photomask and one photoresist coating step. The method involves forming a pixel electrode formation auxiliary film, then using a single photolithography process to pattern both the pixel electrode and pixel isolation film regions, thereby reducing the number of photomasks and photoresist materials required while maintaining manufacturing precision
Solution Approach 2:
The photomask and photoresist materials serve multiple functions simultaneously. The same photomask is used to define both the pixel electrode pattern and pixel isolation film pattern. The photoresist layer serves as a multi-functional mask for patterning multiple layers in one step, reducing material consumption and process complexity while achieving the required patterning precision for different structural elements
2Manufacturing precision
If multiple photomasks and photoresist materials are used for separate layer patterning, then each layer can be independently controlled, but material consumption and manufacturing cost increase
Solution Approach 1:
The patent merges the patterning of pixel electrode and pixel isolation film into a single photolithography step. By forming the pixel electrode formation auxiliary film first and then using one photomask and one photoresist coating process to pattern both structures simultaneously, the method reduces photoresist and photomask consumption while maintaining independent control over the final patterns through careful process design
Solution Approach 2:
The pixel electrode formation auxiliary film is formed in advance before the combined photolithography step. This preliminary action allows the subsequent single photolithography process to simultaneously define both the pixel electrode and pixel isolation film patterns without requiring separate photoresist coatings, thereby reducing material consumption while preserving independent pattern control
3Manufacturing precision
If separate patterning steps are used for each layer, then manufacturing precision is maintained, but the number of manufacturing steps and production time increase
Solution Approach 1:
The patent combines multiple sequential patterning steps into a single parallel patterning operation. By using one photomask and one photoresist coating step to simultaneously pattern both the pixel electrode and pixel isolation film, the method reduces the total number of manufacturing steps and production time while maintaining pattern accuracy through the auxiliary film approach
Solution Approach 2:
The continuous formation of the pixel electrode and pixel isolation film patterns in a single photolithography step eliminates idle time between separate patterning operations. The useful action of pattern formation continues without interruption across multiple structural elements, improving manufacturing efficiency while maintaining precision through the integrated process design
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach simplifies the manufacturing process, reduces material consumption, and lowers costs by allowing for the simultaneous patterning of multiple layers, thereby enhancing the efficiency and cost-effectiveness of producing display devices.
Implementation Method 1
forming a laminated film by photolithography techniques
Data Source
AI summary
Disclosed herein is a manufacturing method of a display device including: forming a gate electrode on a substrate; forming a laminated film by photolithography techniques. The laminated film is provided above the gate electrode with a gate insulating film sandwiched therebetween and includes a semiconductor layer, at least either a source/drain electrode or a pixel electrode, a planarizing film and a pixel isolation film. The manufacturing method further includes forming a functional layer and a common electrode in this order after the formation of the laminated film. The functional layer includes an organic electric field light-emitting layer. Two or more layers are patterned all together in at least part of the laminated film during the formation of the laminated film.