Processing Chamber Lamp Radiation Monitoring for Aging Compensation
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Solution Overview
Problem
Lamps used in substrate processing chambers age differently across regional zones, leading to inconsistent radiation output and increased machine downtimes due to lack of precise monitoring methods.
Innovation Solution
Implement a system with radiation sensors and a controller to monitor and analyze radiation output from lamps, identifying zones within the chamber, and adjust input power or generate alerts for lamp replacement based on aging conditions.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If lamp filament resistance detection is used to monitor lamp aging, then the monitoring method is simple, but the precision is insufficient and can only detect resistance shifting when multiple lamps have shifted
Solution Approach 1:
The patent replaces the electrical resistance detection method with an optical radiation detection method. Radiation sensors measure the actual radiation output of each lamp, providing direct and precise monitoring of lamp aging without relying on indirect electrical parameters. This substitution enables individual lamp monitoring with high precision.
Solution Approach 2:
The patent introduces radiation sensors as intermediary devices between the lamps and the monitoring system. These sensors act as mediators that convert radiation output into measurable signals, enabling precise indirect measurement of lamp aging conditions without direct contact with the lamps.
2Reliability
If on-wafer process results such as thickness profile are used to detect lamp aging, then the detection method is available, but the aging effect can only be detected after it affects the process
Solution Approach 1:
The patent implements preliminary monitoring by continuously measuring radiation output before lamp aging significantly impacts process results. The system detects aging trends early through radiation measurements, enabling proactive lamp replacement before process quality is affected, thus preventing rather than reacting to problems.
Solution Approach 2:
The patent establishes a real-time feedback loop where radiation sensors continuously monitor lamp output and provide immediate data to the control system. This feedback mechanism enables continuous tracking of lamp aging and triggers alerts or power adjustments before aging affects on-wafer process results.
3Ease of operation
If identical input power is provided to different regional zones, then the power distribution is uniform, but the radiation output differs due to different lamp aging rates
Solution Approach 1:
The patent implements local quality control by monitoring and controlling each regional zone's lamp power independently based on its specific aging condition. The system adjusts power delivery to individual zones or lamps according to their radiation output measurements, ensuring each zone maintains appropriate radiation levels despite different aging rates.
Solution Approach 2:
The patent introduces dynamic power adjustment where the input power to lamps is continuously varied based on real-time radiation output measurements and aging trends. The system adapts power delivery dynamically to compensate for aging, transitioning from static identical power distribution to dynamic differentiated power distribution.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enhances precision in lamp control, reducing machine downtimes and increasing throughput by predicting lamp aging and compensating for differences in radiation output across zones.
Implementation Method 1
one or more radiation sensors coupled to the processing chamber, wherein each radiation sensor is proximal at least one lamp... the one or more radiation sensors to convey, to the controller, information associated with radiation emitted by the plurality of lamps
Data Source
AI summary
Embodiments of the present disclosure relates to methods, systems, and apparatus for monitoring radiation output of lamps of processing chambers. In some embodiments, a system contains a plurality of lamps coupled to a chamber, and one or more radiation sensors. Each lamp is identified with one or more zones, the radiation sensors are coupled to the chamber, where each radiation sensor is proximal at least one lamp. A controller contains instructions that, when executed, cause: the radiation sensors to convey, to the controller, information associated with radiation emitted by the lamps; the controller to analyze the information, the analyzing including: for each zone: determining a function of radiation over time; and monitoring the function for a condition associated with lamp aging; and the controller to, based on the analyzing the information, perform at least one of the following: vary input power delivered to the lamps; and generate an alert.