Lamp Window Optics for Uniform Substrate Heating in Etching

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Solution Overview

Problem

Substrate treating apparatuses face issues with non-uniform heating during processes like etching, leading to reduced etch uniformity in central and edge regions of substrates, which affects treatment efficiency.

Innovation Solution

A substrate treating apparatus with a rotatable chuck stage and a window featuring light adjustment means, such as edge and central convex portions, to direct and concentrate heat from lamps onto specific substrate regions, ensuring uniform heating.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Ease of manufacture

If lamps are arranged concentrically with each other, then the structure is simple and easy to manufacture, but the central region of the substrate is less heated than other regions

Engineering Contradiction:
Improvelamp arrangement structureVSAvoidcentral region heating
Core Design Contradiction:
Ease of manufactureVSTemperature

Solution Approach 1:

The patent applies local quality by positioning lamps at specific locations (corners and midpoints of sides) rather than uniform concentric arrangement, and by using a reflective member with specific geometric features (inclined upper surface, lower surface facing the lamp) to direct heat selectively to the central region. This localized structural modification ensures the central region receives adequate heat while maintaining manufacturing simplicity.

Inventive Principle:
Principle #3Local quality

2Ease of manufacture

If the outermost lamp is located inwardly of the substrate end, then structural factors are satisfied, but the edge region of the substrate is relatively less heated

Engineering Contradiction:
Improvelamp positioningVSAvoidedge region heating
Core Design Contradiction:
Ease of manufactureVSTemperature

Solution Approach 1:

The reflective member acts as an intermediary between the lamp and the substrate edge region. It receives heat from the lamp positioned inwardly and redirects it toward the edge region of the substrate, thereby compensating for the reduced direct heating while maintaining the structurally necessary inward lamp positioning.

Inventive Principle:
Principle #24Intermediary (Mediator)

Solution Approach 2:

The reflective member introduces a new spatial dimension by utilizing the vertical space between the lamp and substrate. By positioning the reflective member with its lower surface facing the lamp and upper surface inclined toward the substrate edge, it creates an additional heat transmission path in three-dimensional space, effectively delivering heat to the edge region without moving the lamp outward.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

3Device complexity

If conventional lamp arrangement is used, then device complexity is low, but etch uniformity deteriorates in central and edge regions

Engineering Contradiction:
Improvelamp and window structureVSAvoidetch uniformity
Core Design Contradiction:
Device complexityVSManufacturing precision

Solution Approach 1:

The window is designed with locally differentiated regions: a first region corresponding to the edge region and a second region corresponding to the central region. This local differentiation allows each region to receive appropriate heat distribution, improving etch uniformity while keeping the overall device structure relatively simple.

Inventive Principle:
Principle #3Local quality

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The apparatus achieves uniform heating across the substrate, preventing efficiency deterioration in both central and edge regions, thereby enhancing etch uniformity and overall treatment efficiency.

Implementation Method 1

a window (220) disposed above the lamps (250) to transmit light emitted from the lamps (250)

Methodology Applied
Scientific EffectLight transmission: Light

Implementation Method 2

a plurality of lamps (250) disposed in the support unit (200) to heat the substrate (W) supported on the support unit (200)

Methodology Applied
Scientific EffectLight emission and heating: Light

Data Source

PatentUS11765793B2Substrate treating apparatus
Publication Date: 2023.09.19 SYSTEM ENGINEERING MEGA SOLUTION CO LTD
  • US11765793B2 patent drawing
  • US11765793B2 patent drawing
  • US11765793B2 patent drawing

AI summary

An apparatus for treating a substrate includes a process chamber having a treatment space defined therein, a support unit for supporting the substrate in the treatment space, a liquid supply unit for supplying treating liquid to the substrate supported on the support unit, and a heating unit disposed in the support unit for heating the substrate supported on the support unit, wherein the heating unit includes a plurality of lamps to heat the substrate, and a window disposed above the lamps to transmit light emitted from the lamps, wherein the window includes a base in a form of a plate, and light adjustment means formed on the base to spread or converge light emitted from the lamps.