Lanthanum Oxide Sputtering Target for Insulating Film Stability

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Solution Overview

Problem

The development of a sputtering target for forming insulating oxide films with high dielectric constants and excellent insulating properties is hindered by lanthanum oxide's moisture absorption, leading to powder formation and reduced target stability, which affects the quality and longevity of the sputtering process.

Innovation Solution

A sintered body comprising lanthanum oxide combined with beryllium, magnesium, calcium, or barium oxides, with lanthanum having the highest molar ratio, is used to create a sputtering target that prevents powder formation and maintains high dielectric and insulating properties, while also incorporating additional oxides like aluminum, titanium, or zirconium to enhance stability and voltage resistance.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If lanthanum oxide is used as a sputtering target material to achieve high dielectric constant and excellent insulating properties, then the insulating oxide film quality is improved, but moisture absorption occurs leading to powder formation and reduced target stability

Engineering Contradiction:
Improveinsulating propertyVSAvoidtarget stability
Core Design Contradiction:
ReliabilityVSStability of the object's composition

Solution Approach 1:

The patent applies composite materials by combining lanthanum oxide with at least one oxide selected from beryllium oxide, magnesium oxide, calcium oxide, strontium oxide, or barium oxide. This composite structure maintains the high dielectric constant and insulating properties of lanthanum oxide while the additional oxides prevent moisture absorption and powder formation, thereby resolving the contradiction between reliability and stability.

Inventive Principle:
Principle #40Composite materials

2Manufacturing precision

If lanthanum oxide is used to form insulating oxide films with high dielectric constants, then the film quality is improved, but powder formation occurs reducing target lifespan

Engineering Contradiction:
Improvefilm qualityVSAvoidtarget lifespan
Core Design Contradiction:
Manufacturing precisionVSDuration of action of stationary object

Solution Approach 1:

The composite sputtering target combines lanthanum oxide with stabilizing oxides (beryllium oxide, magnesium oxide, calcium oxide, strontium oxide, or barium oxide). This composition maintains the high dielectric constant and excellent insulating properties necessary for film quality while preventing powder formation through the moisture-resistant characteristics of the composite material, thereby extending target lifespan.

Inventive Principle:
Principle #40Composite materials

3Stability of the object's composition

If lanthanum oxide absorbs moisture then powder formation occurs, but preventing moisture absorption is needed to maintain target stability

Engineering Contradiction:
Improvetarget stabilityVSAvoidpowder formation
Core Design Contradiction:
Stability of the object's compositionVSObject-generated harmful factors

Solution Approach 1:

The patent converts the harmful moisture absorption property of lanthanum oxide into a beneficial feature by combining it with oxides that have complementary properties. The composite structure utilizes the high dielectric constant of lanthanum oxide while the accompanying oxides (beryllium oxide, magnesium oxide, calcium oxide, strontium oxide, or barium oxide) provide moisture resistance, transforming the harmful moisture absorption into a stable, powder-free composite material suitable for sputtering applications.

Inventive Principle:
Principle #22Blessing in disguise (Convert harm into benefit)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The resulting sputtering target effectively forms insulating oxide films with high dielectric constants and excellent insulating properties, preventing moisture absorption and extending the target's lifespan, thereby enabling efficient and stable film deposition for field-effect transistors.

Implementation Method 1

a sputtering target for an insulating oxide film includes a sintered body including a lanthanum oxide and at least one selected from the group consisting of a beryllium oxide, a magnesium oxide, a calcium oxide, a strontium oxide, and a barium oxide

Methodology Applied
Scientific EffectSputtering: Sputtering

Data Source

PatentUS11342447B2Sputtering target for insulating oxide film, method for forming insulating oxide film, and method for producing field-effect transistor
Publication Date: 2022.05.24 RICOH CO LTD
  • US11342447B2 patent drawing
  • US11342447B2 patent drawing
  • US11342447B2 patent drawing

AI summary

A sputtering target for an insulating oxide film, the sputtering target including a sintered body including a lanthanum oxide and at least one selected from the group consisting of a beryllium oxide, a magnesium oxide, a calcium oxide, a strontium oxide, and a barium oxide, wherein lanthanum has highest molar ratio among elements other than oxygen contained in the sintered body.