Laser Barrier for Immersion Lithography Liquid Supply
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Solution Overview
Problem
Micro-bubbles and particles in liquids used in immersion lithography systems cause light scattering, leading to image defects on wafers, which is a challenge in enhancing resolution for semiconductor processes.
Innovation Solution
A method and apparatus utilizing a laser to form a micro-bubble/particle blocking/repelling barrier within a liquid supply system, where the laser is directed across a pipe to create a barrier that blocks or repels micro-bubbles and particles, with outlets to discharge them, integrated into an immersion exposure apparatus for semiconductor processing.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If liquid is used in immersion lithography to reduce wavelength and enhance resolution, then resolution is improved, but micro-bubbles and particles in the liquid cause light scattering and image defects
Solution Approach 1:
The patent applies preliminary action by removing micro-bubbles and particles from the liquid before the liquid reaches the exposure region. The removal device is positioned upstream in the liquid supply path, performing the cleaning action in advance to prevent contaminants from causing light scattering during exposure, thus resolving the contradiction between using liquid for resolution enhancement and avoiding light scattering defects
Solution Approach 2:
The patent applies the extraction principle by removing the harmful components (micro-bubbles and particles) from the liquid medium. The removal device extracts these contaminants from the liquid flow path before the liquid enters the exposure chamber, thereby eliminating the source of light scattering while maintaining the beneficial refractive index effect of the liquid for resolution enhancement
2Object-affected harmful factors
If traditional filtration methods are used to remove micro-bubbles and particles, then device complexity increases, but removal effectiveness may be insufficient
Solution Approach 1:
The patent replaces complex mechanical filtration systems with a less complex removal device that uses alternative mechanisms (such as acoustic, electromagnetic, or optical fields) to remove micro-bubbles and particles. This substitution reduces device complexity while maintaining effective removal of contaminants, as the removal device integrates into the existing liquid supply path without requiring extensive mechanical filtration infrastructure
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Effectively removes micro-bubbles and particles from the liquid, ensuring clearer image transfer and improved resolution in semiconductor processing by preventing light scattering, thus enhancing the capabilities of immersion lithography systems.
Implementation Method 1
a laser provider for providing a laser crossing the pipe
Data Source
AI summary
A liquid supply apparatus capable of removing micro-bubbles and particles is described, including a pipe, a laser provider and at least one micro-bubble/particle outlet. The laser provider provides a laser crossing the pipe, wherein the laser is provided in a manner such that a micro-bubble/particle blocking/repelling barrier is formed crossing the pipe blocking or repelling micro-bubbles, particles or both in the liquid in the pipe. The micro-bubble/particle outlet is disposed on the pipe between the barrier and the liquid inlet of the pipe, adjacent to the barrier for discharging micro-bubbles, particles or both.