Thermal Laser Beam Shaping for Uniform Source Evaporation
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Solution Overview
Problem
Current thermal laser evaporation systems are complex and unreliable due to the need for precise collective movement of components to achieve a stable evaporation rate, which limits the range of synthesis conditions and geometries that can be used.
Innovation Solution
A thermal laser evaporation system with a shaping device between the collimation and focusing lenses that allows for accurate control of the laser beam's position, shape, and size within the vacuum chamber, enabling uniform evaporation and sublimation of source materials without requiring complex movements of components inside and outside the vacuum chamber.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If the laser beam and shielding aperture are moved along propagation axis and surface plane to scan the beam over the source, then the beam position and shape can be varied to achieve uniform evaporation, but the device complexity increases due to precise collective movement of components inside and outside the vacuum chamber
Solution Approach 1:
The patent replaces the mechanical movement system with an optical shaping system. Instead of moving the laser beam and aperture mechanically to achieve uniform evaporation, a beam shaping device (such as a diffractive optical element or spatial light modulator) is used to transform the beam profile and position it precisely on the source. This substitution eliminates the need for complex mechanical positioning while maintaining the ability to achieve uniform evaporation rates across the source material.
Solution Approach 2:
The patent introduces a beam shaping device as an intermediary between the laser source and the material being processed. This intermediary component modifies the beam characteristics (shape, size, position) without requiring movement of the laser or aperture. The beam shaping device acts as a mediator that transforms the initial beam profile into the desired uniform distribution on the source, thereby avoiding the complexity of coordinated mechanical movements.
2Stability of the object's composition
If the source size, laser power and beam size are matched to achieve stable evaporation rate, then the evaporation process becomes controllable, but the adaptability to different synthesis conditions and geometries decreases
Solution Approach 1:
The patent implements dynamic beam shaping capabilities that allow real-time adjustment of beam parameters (shape, size, position) without changing the physical configuration of the system. By using programmable beam shaping devices such as spatial light modulators or variable focal length lenses, the system can adapt to different source geometries, sizes, and material properties while maintaining stable evaporation rates. This dynamic control enables versatility across multiple synthesis conditions without sacrificing stability.
Solution Approach 2:
The patent utilizes parameter changes in the laser beam characteristics through optical shaping elements. By modifying beam parameters such as waist size, curvature, and profile shape through lenses, mirrors, or diffractive elements, the system can accommodate different source geometries and material types. This approach allows the same physical setup to achieve stable evaporation across varying conditions by simply adjusting optical parameters rather than reconfiguring the entire system.
3Manufacturing precision
If the laser beam is scanned across a larger source or the source size is reduced to achieve uniform evaporation, then the evaporation uniformity improves, but the productivity decreases due to the time required for beam scanning or source adjustment
Solution Approach 1:
The patent applies preliminary action by pre-shaping the laser beam before it reaches the source material. Instead of relying on dynamic scanning or adjustment during the evaporation process, the beam is pre-formed with the appropriate profile, size, and position using optical shaping elements. This preliminary configuration ensures uniform energy distribution across the source from the start, eliminating the need for time-consuming scanning or adjustment operations and thereby maintaining high productivity while achieving uniform evaporation.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution simplifies the control of laser beam parameters, ensuring high accuracy and cost-efficiency, allowing for a wide range of source materials to be uniformly evaporated or sublimated, and enabling flexible adaptation to different source geometries and materials.
Implementation Method 1
a thermal laser beam shaping system comprising a collimation lens and a focusing lens for directing the thermal laser beam onto the source
Implementation Method 2
a thermal laser beam shaping system comprising a collimation lens and a focusing lens for directing the thermal laser beam onto the source
Implementation Method 3
a laser light source for providing a thermal laser beam for evaporating one or more materials from a source
Implementation Method 4
for evaporating one or more materials from a source
Implementation Method 5
enabling uniform evaporation and sublimation of source materials
Data Source
AI summary
The present invention is related to a thermal laser evaporation system (10), the thermal laser evaporation system (10) comprising:a laser light source (30) for providing a thermal laser beam (34) for evaporating one or more materials (22) from a source (20);a thermal laser beam shaping system (40) comprising a collimation lens (42) and a focusing lens (44) for directing the thermal laser beam (34) onto the source (20);a vacuum chamber (12);a vacuum window (14) for conducting the thermal laser beam (34) into the vacuum chamber (12); andan aperture (16) arranged within the vacuum chamber (12) between the vacuum window (14) and the source (20).Further, the present invention is related to a method of providing a thermal laser beam (34) at a source (20) in order to evaporate one or more materials (22) from the source (20); the method comprising the steps of:providing a thermal laser beam (34);directing the thermal laser beam (34) via a thermal laser beam shaping system (40) comprising a collimation lens (42), a shaping device (60) and a focusing lens (44) into a vacuum chamber (12) comprising a vacuum window (12) for conducting the thermal laser beam (34) into the vacuum chamber (12) and through an aperture (16) arranged within the vacuum chamber (12) at the source (20).