Laser Catalyst Cleaning to Mitigate Long-Term Energy Decay

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Solution Overview

Problem

Existing EUV lithography systems experience significant long-term energy decay in laser power, leading to costly and time-consuming replacements, as contamination builds up on the catalyst surfaces within the laser generators, reducing efficiency and operational lifespan.

Innovation Solution

Implementing a hydrogen-doped mixing gas to react with and remove SiO2 contamination layers on the catalyst surfaces during online and offline cleaning processes, using a computer-controlled system to monitor and initiate cleaning when necessary, thereby maintaining laser power and extending the EUV generation efficiency.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Power

If a high-power laser beam is focused onto fuel droplet targets to generate EUV light, then EUV emission is achieved, but long-term energy decay occurs due to contamination buildup on catalyst surfaces

Engineering Contradiction:
Improvelaser powerVSAvoidlaser power stability
Core Design Contradiction:
PowerVSReliability

Solution Approach 1:

The system performs preliminary cleaning actions by introducing hydrogen-doped mixing gas to the catalyst surfaces before contamination significantly degrades laser power. The computer-controlled system monitors catalyst condition and initiates cleaning processes proactively, preventing the buildup of SiO2 contamination layers that would otherwise cause energy decay and power instability.

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

Hydrogen-doped mixing gas serves as an intermediary substance that reacts with SiO2 contamination on catalyst surfaces. The hydrogen in the mixing gas chemically interacts with the contamination layers, removing them from the catalyst surfaces and restoring laser efficiency without requiring direct mechanical intervention or system shutdown.

Inventive Principle:
Principle #24Intermediary (Mediator)

2Productivity

If laser operation continues without maintenance, then productivity is maintained, but contamination builds up on catalyst surfaces reducing efficiency

Engineering Contradiction:
ImproveEUV generation efficiencyVSAvoidlaser energy decay
Core Design Contradiction:
ProductivityVSLoss of energy

Solution Approach 1:

The cleaning system operates continuously or periodically without interrupting EUV generation productivity. The computer-controlled system manages cleaning cycles that can occur during low-demand periods or between production runs, ensuring catalyst surfaces remain clean and energy-efficient while maintaining continuous EUV output when needed.

Inventive Principle:
Principle #20Continuity of useful action

Solution Approach 2:

The laser system performs self-maintenance by automatically introducing hydrogen-doped mixing gas to clean its own catalyst surfaces. The computer-controlled system monitors the laser's own performance and initiates cleaning when contamination is detected, enabling the system to maintain its own efficiency without external intervention or manual maintenance.

Inventive Principle:
Principle #25Self-service

3Reliability

If replacement or repair of lasers is performed, then power decay is reset, but the process is time-consuming and expensive

Engineering Contradiction:
Improvelaser powerVSAvoidmaintenance time
Core Design Contradiction:
ReliabilityVSLoss of time

Solution Approach 1:

Instead of replacing entire laser systems when contamination occurs, the invention uses a low-cost cleaning approach with hydrogen-doped mixing gas. This disposable cleaning method restores catalyst performance without the need for expensive laser replacement or complex repair procedures, significantly reducing both time and cost while maintaining reliability.

Inventive Principle:
Principle #27Cheap short-living objects (Disposable)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach effectively stabilizes the EUV laser power, reducing decay rates and maintaining production efficiency by continuously cleaning the catalyst surfaces, thus preventing premature degradation and extending the operational life of EUV lithography systems.

Implementation Method 1

a hydrogen-doped mixing gas to react with and remove SiO2 contamination layers on the catalyst surfaces

Methodology Applied
Scientific EffectChemical reaction: Chemical Bonding

Implementation Method 2

By focusing a high-power laser beam, as generated by a carbon dioxide (CO2) laser and the like, onto small fuel droplet targets in order to transition it into a highly-ionized LPP

Methodology Applied
Scientific EffectLaser heating: Laser

Implementation Method 3

transition it into a highly-ionized LPP

Methodology Applied
Scientific EffectIonization: Ionisation

Implementation Method 4

This plasma emits EUV light with a peak maximum emission of about 13.5 nm or smaller

Methodology Applied
Scientific EffectPlasma emission: Plasma

Data Source

PatentUS12147166B2Mitigating long-term energy decay of laser devices
Publication Date: 2024.11.19 TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD
  • US12147166B2 patent drawing
  • US12147166B2 patent drawing
  • US12147166B2 patent drawing

AI summary

An apparatus for manufacturing semiconductors includes a power amplifier to power a laser, a catalyst disposed in the power amplifier, an inlet port, and an exhaust port. The inlet port introduces a mixing gas to an interior of the power amplifier during a cleaning operation so that the mixing gas contacts a surface of the catalyst having a build-up thereon. The mixing gas reacts with and removes the build-up by generating gaseous by-products. The exhaust port removes the gaseous by-products from the power amplifier.