Laser Irradiation Cover With Purge Gas for Precise Substrate Etching
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Solution Overview
Problem
The existing photolithography processes face challenges in achieving precise etching of patterns on substrates due to distortions caused by particles or droplets on the irradiating module, which affect the accuracy and durability of the etching process.
Innovation Solution
The proposed solution involves an irradiating module with a housing, a laser unit, and a cover with a purge gas supply system, including a dividing member with slits to manage purge gas flow, which minimizes particle and droplet interference, ensuring precise etching and increased module durability.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If particles or droplets are present on the irradiator, then the etching precision deteriorates due to light path distortion, but adding protective measures may increase device complexity
Solution Approach 1:
A cover is introduced as an intermediary component between the irradiator and the external environment. This cover protects the irradiator from particles and droplets while maintaining the light path through strategically positioned openings, thus preventing etching precision deterioration without requiring complex protective systems
Solution Approach 2:
Purge gas is supplied to create an inert environment around the irradiator, preventing particles and droplets from contaminating the light path. This simple atmospheric control method effectively maintains etching precision without adding mechanical complexity to the device
2Reliability
If particles or droplets attach to the irradiator, then the durability decreases due to corrosion, but increasing protection may reduce light irradiation efficiency
Solution Approach 1:
The cover acts as a protective intermediary that shields the irradiator from corrosive particles and droplets, extending durability. The openings in the cover are positioned to maintain unobstructed light paths, ensuring that light irradiation efficiency is not compromised by the protective structure
Solution Approach 2:
By supplying purge gas to create an inert atmosphere around the irradiator, the system prevents corrosion from particles and droplets, enhancing durability. This atmospheric protection method does not interfere with light transmission, maintaining irradiation efficiency
3Object-affected harmful factors
If the light irradiation path is exposed, then particle contamination increases, but enclosing the path may distort the light angle and profile
Solution Approach 1:
The cover serves as a protective intermediary that reduces particle contamination in the light path area. Strategic openings are provided in the cover to allow light to pass through without angle distortion, while still shielding the surrounding areas from particle contamination
Solution Approach 2:
The cover is designed with localized openings only where light needs to pass through, maintaining light angle accuracy in those specific areas. The rest of the cover provides contamination protection, creating different functional zones with appropriate properties for each location
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration enables precise etching of patterns on substrates by maintaining the integrity of the laser light path and reducing particle interference, thereby enhancing the accuracy and longevity of the irradiating module.
Implementation Method 1
a laser unit including a laser in the installation space which emits a laser light in a first direction
Implementation Method 2
a reflector directing the laser light in a second direction
Implementation Method 3
a purge gas supply unit for supplying a purge gas to the inner space
Data Source
AI summary
The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a support unit configured to support and rotate a substrate at a treating space; a liquid supply unit configured to supply a liquid to the substrate supported at the support unit; a housing having an installation space; a laser unit configured to include a laser irradiation unit positioned in the installation space which irradiates a laser light, and an irradiation end having an end positioned to protrude from the housing and which irradiates the laser light irradiated from the laser irradiation unit to a substrate supported on the support unit; and a cover having an inner space and positioned so an end of the irradiation end protruding from the housing is positioned in the inner space, and wherein an opening is formed at a bottom end of the cover to overlap the laser light irradiated from the irradiation end when seen from above.