Laser-Defined Metal Grid Lines for Narrow Thin-Film Solar Cell Electrodes
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Solution Overview
Problem
Existing methods for preparing metal grid lines in thin-film solar cells face challenges such as high cost, low throughput, material waste, and difficulty in controlling the width and thickness of the grid lines, leading to increased shading and conduction loss, which affect the efficiency and performance of solar cells.
Innovation Solution
A method involving the use of protrusions on the target layer to confine the position and shape of linear structures, such as metal grid lines, by applying a liquid-type material between protruding lines formed by pulsed laser processing, allowing for precise control of the aspect ratio and deposition of the grid lines.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Area of stationary object
If the width and thickness of metal grid lines are reduced to minimize shading, then the dead area is reduced, but the series resistance increases and conduction loss increases
Solution Approach 1:
The patent applies parameter changes by precisely controlling the width and thickness of metal grid lines through a multi-step deposition process. The method enables independent optimization of these parameters, allowing the grid lines to achieve minimal width for reduced shading while maintaining sufficient thickness for adequate electrical conductivity, thus resolving the contradiction between minimizing dead area and maintaining reliability.
Solution Approach 2:
The patent uses composite materials by depositing multiple layers including metal grid line material, buffer layer, and absorber layer in sequence. This composite structure allows the metal grid lines to achieve both optical transparency (reduced shading) and electrical conductivity through the coordinated properties of different materials and their layered arrangement.
2Use of energy by moving object
If the front electrode layer thickness is reduced to increase photocurrent, then the light transmission is improved, but the sheet resistance increases and conduction loss increases
Solution Approach 1:
The patent applies parameter changes by optimizing the thickness of the front electrode layer and the dimensions of metal grid lines deposited on it. The method enables the front electrode to achieve sufficient light transmission for high photocurrent while the metal grid lines provide enhanced electrical conductivity pathways, resolving the contradiction between energy conversion efficiency and electrical reliability.
3Ease of manufacture
If conventional methods are used to prepare metal grid lines, then the process is simple, but the manufacturing precision of grid line width and thickness is poor
Solution Approach 1:
The patent applies segmentation by dividing the metal grid line formation into multiple sequential deposition steps, each controlling specific dimensions. The process segments the formation of grid line width and thickness into separate controllable stages, enabling precise dimensional control while maintaining a systematic and manageable manufacturing process.
Solution Approach 2:
The patent replaces conventional mechanical or single-step deposition methods with a multi-step physical vapor deposition process. This substitution enables precise control over grid line dimensions through controlled deposition parameters, achieving high manufacturing precision while maintaining process feasibility.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This method enhances the efficiency of thin-film solar cells by reducing shading and conduction loss, improving photocurrent generation, and optimizing the aspect ratio of metal grid lines, thereby increasing the power conversion efficiency.
Implementation Method 1
forming a protruding line at at least one side position by producing a plurality of protrusions at intervals along the side length direction at at least one of the first side position and the second side position of the upper surface of the target layer
Implementation Method 2
applying a liquid-type linear structure material to one side of the protruding line for deposition to obtain a linear structure confined to one side by the protruding line
Data Source
AI summary
The present invention discloses a method for preparing a small-width linear structure on the upper surface of a target layer of a layer stack and application thereof. The method includes the steps of: acquiring the preset positions of both sides of the linear structure on the upper surface of the target layer, which are denoted as a first side position and a second side position; forming a protruding line at at least one side position by producing a plurality of protrusions at intervals along the side length direction at at least one of the first side position and the second side position of the upper surface of the target layer; and applying a liquid-type linear structure material to one side of the protruding line for deposition to obtain a linear structure confined to one side of the protruding line.