Laser Focal Position Correction Using Z-Axis Adjustment

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Solution Overview

Problem

Conventional processing apparatuses require multiple position adjustment operations to accurately set the laser focal position due to non-parallel changes in the laser focal position and emission direction, leading to inefficiencies and increased workload when correcting errors between the laser focal position and the target processing position, especially when thermal expansion causes deformation in workpieces.

Innovation Solution

A processing apparatus equipped with a laser emitter, processing position specifying device, target emission condition computing device, emission controller, correction amount specifying device, and post-correction focal position computing device, which allows for adjustment of the laser emission direction and focal length to align the focal position with the target processing position using coordinate conversion information, enabling correction based solely on the Z-axis correction amount.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If multiple position adjustment operations are performed to correct the laser focal position, then the laser focal position can be accurately set to the target processing position, but the time and workload required for position adjustment operations increases

Engineering Contradiction:
Improvelaser focal position accuracyVSAvoidposition adjustment time
Core Design Contradiction:
Manufacturing precisionVSLoss of time

Solution Approach 1:

The patent performs preliminary calculation of the relationship between laser emission direction and focal position change direction before actual processing. By pre-computing the correction amounts in X, Y, and Z directions based on the non-parallel relationship between emission direction and focal position change, the system can directly apply the correct correction without iterative adjustments, thus reducing adjustment time while maintaining accuracy

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The patent implements a feedback mechanism where the correction amount specifying device receives information about the focal position deviation and automatically calculates the required correction amounts in multiple directions. This feedback loop eliminates the need for manual multiple adjustment operations by providing automated, precise correction based on the computed relationship between emission direction and focal position

Inventive Principle:
Principle #23Feedback

2Manufacturing precision

If multiple position adjustment operations are performed to correct the laser focal position, then the laser focal position can be accurately set to the target processing position, but the workload for position adjustment operations increases

Engineering Contradiction:
Improvelaser focal position accuracyVSAvoidposition adjustment workload
Core Design Contradiction:
Manufacturing precisionVSEase of operation

Solution Approach 1:

The system performs self-correction by automatically calculating the correction amounts in X, Y, and Z directions based on the pre-computed relationship between laser emission direction and focal position change. The correction amount specifying device autonomously determines the necessary adjustments without requiring operator intervention for multiple iterative adjustments, thereby reducing workload while achieving accurate focal position setting

Inventive Principle:
Principle #25Self-service

Solution Approach 2:

The patent replaces manual mechanical adjustment operations with automated computational correction. By substituting the mechanical iterative adjustment process with computer-based calculation of correction amounts based on the emission direction-focal position relationship, the system reduces operational workload while maintaining precision

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

Data Source

PatentUS11148224B2Processing apparatus and program
Publication Date: 2021.10.19 FUTABA IND CO LTD
  • US11148224B2 patent drawing
  • US11148224B2 patent drawing
  • US11148224B2 patent drawing

AI summary

A processing apparatus, which is provided with a processing space to place a workpiece therein and configured to process the workpiece placed in the processing space using a laser, includes a laser emitter, a processing position specifying device, a target emission condition computing device, an emission controller, a correction amount specifying device, a post-correction focal position computing device, and a post-correction emission condition computing device. The emission controller controls the laser emitter to emit the laser under a post-correction emission condition when a Z-axis correction amount is updated in the correction amount specifying device.