Laser Heating Substrate Drying to Suppress Pattern Collapse
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Solution Overview
Problem
Existing substrate processing technologies face challenges in preventing pattern collapse during the drying of liquid films on concavo-convex patterns, as the surface tension of processing liquids can cause structural issues.
Innovation Solution
A substrate processing apparatus that includes a substrate holder, a liquid supply unit for forming a liquid film on concavo-convex patterns, a heating unit using a laser beam to heat the liquid film, and a heating controller to control the heating process, ensuring thorough exposure of the liquid film in the depth direction to reduce surface tension effects.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a liquid film is supplied to cover the concavo-convex pattern, then the pattern surface is protected and smoothed, but the liquid surface tension causes pattern collapse during drying
Solution Approach 1:
The patent applies laser irradiation to change the temperature parameter of the liquid film, heating it to reduce surface tension effects. By controlling the temperature parameter through laser energy input, the harmful surface tension forces are mitigated while maintaining the protective liquid film coverage, thus preventing pattern collapse during drying
Solution Approach 2:
The patent utilizes the phase transition of the liquid film from liquid to vapor through laser-induced heating. By controlling the heating process, the liquid film gradually evaporates, reducing surface tension effects during the transition phase and preventing pattern collapse while maintaining pattern integrity
2Productivity
If the liquid film is heated to dry it, then the drying process is accelerated, but the concavo-convex pattern may be damaged by excessive heating
Solution Approach 1:
The patent applies laser irradiation locally to the liquid film covering the concavo-convex pattern, enabling selective heating of only the liquid regions. This local quality approach accelerates drying of the liquid film while maintaining controlled temperature conditions that protect the underlying pattern structure from damage
Solution Approach 2:
The patent employs periodic or pulsed laser irradiation to heat the liquid film in controlled intervals. This periodic action allows the liquid film to be heated and evaporated in cycles, achieving rapid drying while providing thermal relaxation periods that prevent excessive heat accumulation and pattern damage
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The apparatus effectively suppresses pattern collapse by controlling the heating process to manage surface tension, ensuring the concavo-convex patterns are preserved during the drying of liquid films, preventing unintended exposure and adhesion of particles.
Implementation Method 1
a heating unit configured to irradiate the substrate held by the substrate holder or the liquid film with a laser beam for heating the liquid film
Data Source
AI summary
There is provided a substrate processing apparatus, including: a substrate holder configured to hold a substrate with a surface of the substrate on which a concavo-convex pattern is formed oriented upward; a liquid supply unit configured to supply a processing liquid to the substrate held by the substrate holder to form a liquid film at least in a concave portion of the concavo-convex pattern; a heating unit configured to irradiate the substrate held by the substrate holder or the liquid film with a laser beam for heating the liquid film; and a heating controller configured to control the heating unit, wherein the heating controller controls the heating unit to expose the entire concave portion in a depth direction from the processing liquid by irradiating the laser beam onto the substrate or the liquid film from the heating unit.