Laser Interference Nanopatterning for Large-Area Uniform Surfaces
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Solution Overview
Problem
Existing techniques for generating nanostructures on large surfaces are costly, complex, and time-consuming, particularly when attempting to achieve sub-micrometric or nanometric periodic patterns with high regularity and homogeneity.
Innovation Solution
A device and process utilizing a picosecond laser to generate a periodic nanostructured pattern by spatially and temporally superimposing two laser beams with a specific fluence and angle of incidence, allowing for the creation of regular, homogeneous nanostructures over large areas.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If lithography techniques are used to generate nanostructures on large surfaces, then manufacturing precision is improved, but device complexity and manufacturing cost increase significantly
Solution Approach 1:
The patent replaces complex mechanical lithography systems with a laser-based interference system. Two laser beams are interfered to create periodic intensity distributions that directly generate nanostructures on the material surface, eliminating the need for complex lithography machinery while achieving comparable or superior precision
Solution Approach 2:
The invention uses periodic laser interference patterns to create regular nanostructure arrays. By controlling the interference angle and wavelength, periodic structures with precise spacing are generated directly on the surface, simplifying the manufacturing process while maintaining high precision
2Manufacturing precision
If lithography techniques are applied to large surfaces, then manufacturing precision is improved, but productivity decreases due to multiple steps and long manufacturing times
Solution Approach 1:
The laser interference pattern is pre-calculated and designed to cover the entire large surface area in a single pass. The interference geometry is configured beforehand to generate the complete periodic nanostructure pattern across the target area, eliminating the need for multiple sequential manufacturing steps
Solution Approach 2:
The invention extends the interference pattern from a small focal spot to a large surface area by utilizing the spatial coherence of laser beams over extended paths. The interference pattern is projected across the entire target area simultaneously, transforming a point-by-point process into a area-wide parallel process that dramatically increases productivity
3Area of stationary object
If DLIP technique is used to extend structured surface area, then area of stationary object is improved, but device complexity increases due to scanner requirements
Solution Approach 1:
The patent employs a dynamic scanning approach where the laser beam is rapidly swept across the surface using galvanometric mirrors. This dynamic beam positioning allows the same interference optics to cover large areas without requiring complex mechanical stage movements or large-aperture optics, simplifying the overall system while achieving large-area structuring
4Area of stationary object
If DLIP technique uses scanner to move beam interference zone, then area of stationary object is improved, but manufacturing precision deteriorates due to scanner aperture limits
Solution Approach 1:
The invention optimizes the laser wavelength and interference angle parameters to achieve the desired spatial period precision. By carefully selecting and controlling these parameters, the system maintains high precision nanostructure spacing even when scanning across large areas, overcoming the aperture limitations of conventional scanners
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution enables the generation of periodic nanostructures with sub-micrometric or nanometric periods on large surfaces in a faster, simpler, and less expensive manner compared to traditional methods, while maintaining high regularity and homogeneity.
Implementation Method 1
a laser source adapted to generate a source pulse beam at a wavelength λ
Implementation Method 2
the first secondary beam and the second secondary beam superimposed spatially and temporally in said area have a fluence greater than the ablation threshold of the material
Implementation Method 3
an optical beam splitter arranged to spatially separate the source pulse beam into a first secondary beam and a second secondary beam
Implementation Method 4
the optical focusing system being capable of focusing and superimposing the first secondary beam and the second secondary beam on the same area of the surface of the material at an angle of incidence ALPHA
Implementation Method 5
an optical focusing system having an aperture adapted to receive the first secondary beam and the second secondary beam
Data Source
Figure 1~2
Figure 3~4
Figure 5
AI summary
The invention relates to an apparatus (100) and method for generating a nanostructured pattern on the surface of a material (33), the apparatus (100) comprising a laser source (1) of wavelength À, an optical beam splitter (2), a first optical system (21, 22, 23, 24, 25, 26, 27, 28) configured to direct a first secondary beam (11) and a second secondary beam (12) parallel to the same direction with a separating distance, and a focusing optical system (31). The source pulses have a duration comprised between 100 fs and 100 ps, and the first secondary beam (11) and the second secondary beam (12) are focused and superposed on a region of the material (33) with a fluence higher than the ablation threshold of the material (33), so as to induce a periodic nanostructured pattern having, in the plane of incidence, a spatial modulation period equal to an integer fraction of the DLIP period, DLIP standing for direct laser interference patterning.