Combined Laser and Broad Ion Beam Polishing for Multi-Sample Throughput
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Broad Ion Beam (BIB) polishing systems face inefficiencies due to the need for precise sample alignment and frequent cleaning of the ion source, leading to reduced workflow efficiency and downtime, limiting their use primarily to academic and non-commercial applications.
Innovation Solution
A combined laser and BIB system is introduced, where a laser source rapidly removes initial sample portions, and a BIB source carefully exposes the region of interest, improving throughput and surface quality by allowing continuous processing without downtime through the use of additional ion sources.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If a high current broad ion beam is used to rapidly remove sample material, then sample preparation speed is improved, but the rate of redeposition onto the ion source increases requiring frequent cleaning and causing downtime
Solution Approach 1:
The patent divides the ion beam system into multiple independent ion sources (first BIB source and second BIB source) that can operate separately. This segmentation allows one source to be cleaned or maintained while the other continues processing samples, thereby reducing system downtime while maintaining high productivity
Solution Approach 2:
The patent implements continuous sample preparation by having multiple ion sources available. When one ion source requires cleaning, the system switches to another source without interrupting the overall processing workflow, ensuring continuity of useful action and minimizing loss of time
2Productivity
If a high current broad ion beam is used to rapidly remove sample material, then material removal rate is improved, but precise alignment with masks becomes more critical and time-consuming
Solution Approach 1:
The patent segments the sample preparation process into two distinct stages: rough material removal and precise final exposure. Multiple ion sources with different characteristics can be used for each stage, allowing high removal rates in the first stage while dedicated precision alignment is performed for the second stage
Solution Approach 2:
The patent performs preliminary rough material removal using high current ion beams before final precise alignment and exposure. This preliminary action removes the bulk of material that needs to be removed, reducing the amount of material that requires precise alignment and mask work in subsequent steps
3Productivity
If a laser source is used to rapidly remove initial sample portions, then processing speed is improved, but surface quality may be compromised requiring subsequent BIB polishing
Solution Approach 1:
The patent segments the sample preparation process into two sequential operations: laser ablation for rapid bulk material removal followed by BIB polishing for surface quality improvement. This segmentation allows each process to optimize for its specific function - speed for laser, quality for BIB
Solution Approach 2:
The patent merges laser technology with BIB polishing technology into a single integrated system. The laser source and BIB source are combined in one system, allowing rapid laser removal followed immediately by BIB polishing to achieve both high processing speed and high surface quality
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach significantly enhances the efficiency and uptime of BIB systems, enabling faster and more accurate sample preparation with reduced downtime, making them suitable for commercial applications by automating the processing of multiple samples.
Implementation Method 1
causing a laser source component of the combined BIB and laser sample preparation system to emit an optical beam towards the sample... The optical beam and the broad ion beam are each configured to cause a first portion and a second portion of the sample upon which it is incident to be removed, respectively
Implementation Method 2
causing a BIB source component of the combined BIB and laser sample preparation system to emit a broad ion beam towards the sample... the broad ion beam causes a second portion of the sample upon which it is incident to be removed to reveal a region of interest
Data Source
Figure 1
Figure 2
Figure 3
AI summary
Systems and methods for operating a combined laser and broad ion beam (BIB) polisher in a sample preparation workflow, are disclosed. An example method for operating a combined laser and broad ion beam (BIB) polisher according to the present invention comprises positioning a sample within the interior volume of the combined BIB and laser sample preparation system, causing a laser source component of the combined BIB and laser sample preparation system to emit an optical beam towards the sample, and causing a BIB source component of the combined BIB and laser sample preparation system to emit a broad ion beam towards the sample. The optical beam and the broad ion beam are each configured to cause a first portion and a second portion of the sample upon which it is incident to be removed, respectively.