Laser-Written Light Deflection Structure for Precise Beam Orientation
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Solution Overview
Problem
Existing light deflection structures lack the ability to achieve targeted light deflection with specific strength and orientation, which is necessary for applications like laser disks and solar cells where unwanted light needs to be minimized or directed efficiently.
Innovation Solution
A method involving pulsed laser irradiation of a substrate to create Type II modifications through spatial overlap of interaction regions, allowing for the generation of predetermined diffractive or scattering deflection geometries by varying process parameters such as spectrum, pulse energy, and polarization, enabling controlled light deflection.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If periodic material modifications are used to influence light properties, then light transmission can be controlled, but the ability to achieve targeted light deflection with specific strength and orientation is insufficient
Solution Approach 1:
The patent applies parameter changes by systematically varying multiple laser process parameters (pulse energy, pulse duration, repetition rate, wavelength, polarization, focus position) to create different types of material modifications (Type I, Type II, Type III) with distinct optical properties. This enables precise control over light deflection characteristics including deflection angle, intensity, and orientation by adjusting the laser inscription parameters
Solution Approach 2:
The patent implements local quality by creating spatially differentiated material modifications within the substrate using controlled laser scanning patterns. Different regions of the substrate receive different laser parameters to create localized grating structures with specific periodicities and orientations, enabling position-dependent light deflection control for complex optical beam shaping
2Manufacturing precision
If multiple laser parameters are varied to create predetermined deflection geometry, then targeted light deflection is achieved, but the process complexity increases
Solution Approach 1:
The patent applies preliminary action by using computational design and simulation to pre-determine the optimal laser inscription parameters and scanning patterns before actual manufacturing. The desired light deflection geometry is calculated in advance, and the corresponding laser process parameters are optimized through modeling, reducing trial-and-error during production and simplifying the actual manufacturing process
Solution Approach 2:
The patent replaces complex mechanical adjustment systems with a computer-controlled laser inscription system. Instead of mechanically assembling optical elements to achieve desired deflection geometries, the system uses software-controlled laser parameters and automated scanning patterns to directly write the required microstructures into the substrate, reducing mechanical complexity while improving precision
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The method enables localized and targeted light deflection, enhancing the efficiency of light coupling or retention in applications like laser disks and solar cells by creating structured nanostructures that influence light propagation.
Implementation Method 1
a substrate material (5) of a substrate (7) is irradiated with at least one pulsed laser beam
Implementation Method 2
the type II modifications result from self-organizing effects through multiple irradiation of the same location
Implementation Method 3
these material modifications influence properties of light transmitted by the substrate
Implementation Method 4
a predetermined diffractive or scattering deflection geometry is generated
Data Source
Figure 1a~1b
Figure 2~3
AI summary
The invention relates to a method for producing a light deflection structure (3), wherein a substrate material (5) of a substrate (7) is irradiated with at least one pulsed laser beam, comprising the following steps: generating a first plurality of interaction regions (9), in which the at least one laser beam interacts with the respective substrate material (5), along a first path (P1) with spatial overlapping of the interaction regions (9); generating a second plurality of interaction regions (9) with spatial overlapping of the interaction regions (9) along a second path (P2) that is offset relative to the first path and with spatial overlapping with the first path (P1); such that type II modifications of the substrate material (5) are generated, wherein at least one process parameter is changed from path (P1, P2, PN) to path (P1, P2, PN), in order to generate a predetermined deflection geometry.