3D Laser Lithography Edge Dose Control for Precise Surface Gradients
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Solution Overview
Problem
Laser lithography methods face challenges in achieving high precision and design freedom due to resolution limits and inaccuracies in reproducing continuous surface gradients and densely packed structures, leading to undesirable deviations between the desired and resulting structures.
Innovation Solution
A method using direct laser writing in a volume of lithography material, where the exposure dose is varied spatially and locally through multi-photon absorption, allowing for precise control of the structure by changing the exposure dose in edge sections of partial structures to compensate for inaccuracies and create desired surface features.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If the overall structure is broken down into smaller substructures to improve precision, then manufacturing precision is improved, but the number of substructures increases leading to longer process time
Solution Approach 1:
The patent applies parameter changes by dynamically adjusting the exposure dose based on the local geometric characteristics (slope and curvature) of the outer surface. This allows the system to maintain high precision for complex surface gradients without requiring excessive subdivision into substructures, thereby reducing the total number of writing operations and process time.
2Manufacturing precision
If the overall structure is broken down into smaller substructures to improve precision, then manufacturing precision is improved, but device complexity increases due to more substructures to generate
Solution Approach 1:
The patent uses parameter changes by modifying the exposure dose according to local surface geometry (slope and curvature). This approach maintains manufacturing precision for complex structures without requiring complex device configurations or excessive substructure generation, thereby reducing computational and operational complexity.
3Manufacturing precision
If exposure dose is increased in edge sections to compensate for step effects, then manufacturing precision is improved, but energy consumption increases
Solution Approach 1:
The patent applies local quality by adjusting the exposure dose specifically in edge sections where the laser beam writes structure details, based on the local slope and curvature of the outer surface. This localized adjustment improves surface gradient accuracy without uniformly increasing energy consumption across the entire structure, thereby optimizing energy efficiency.
4Manufacturing precision
If finer screening of the overall structure is performed only in areas with strong contour changes, then manufacturing precision is improved, but computing effort increases leading to longer process time
Solution Approach 1:
The patent applies local quality by performing finer screening and adjusting the exposure dose only in areas with strong contour changes (edge sections with high slope and curvature). This localized approach improves precision where needed without unnecessarily increasing computing effort and process time for areas with simple geometry.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enables the creation of precise, continuous surface structures with reduced inaccuracies and process times, allowing for the generation of complex shapes with improved surface gradients and reduced 'step' and 'bulging' effects.
Implementation Method 1
an exposure dose is radiated into the lithography material in a spatially resolved manner in a focus area of a laser writing beam using two-photon absorption or multi-photon absorption in general
Implementation Method 2
an exposure dose is radiated into the lithography material in a spatially resolved manner in a focus area of a laser writing beam using two-photon absorption or multi-photon absorption in general
Data Source
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AI summary
The invention relates to a method for producing a three-dimensional overall structure (10) by means of laser lithography, the overall structure (10) being approximated by at least one partial structure (14), wherein, for the purposes of writing the partial structure (14), an exposure dose is radiated into the lithography material in a focal region of a laser writing beam while exploiting multi-photon absorption. Here, in the partial structure (14), the exposure dose in those edge portions (20) that immediately adjoin an external surface (12) of the overall structure (10) to be produced is modified in comparison with the remaining partial structure (14). The invention also relates to a computer program product adapted to the method.