Integrated Laser Modulator Structure for Scattered-Light Absorption

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Solution Overview

Problem

Existing optical semiconductor devices with integrated semiconductor laser and optical modulator sections face issues with leakage light, leading to decreased extinction ratios, especially during high-power operation, due to the difficulty in processing light-shielding films on the output end surface.

Innovation Solution

The optical semiconductor device incorporates a semiconductor laser section and an optical modulator section with a light absorption layer made of group III-V semiconductor compound crystal containing Bi, and scattered-light absorption layers facing either the lower or upper surface of the light absorption layer to absorb scattered light, reducing leakage and heat-induced pile-up phenomena.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If a light-shielding film with an opening is formed on the output end surface of the optical modulator section to shield leakage light, then the extinction ratio is improved, but the processing difficulty and manufacturing complexity increase significantly

Engineering Contradiction:
Improveextinction ratioVSAvoidprocessing difficulty
Core Design Contradiction:
ReliabilityVSEase of manufacture

Solution Approach 1:

The patent extracts the light-shielding function from a separate film structure and integrates it into the optical modulator section's semiconductor layers. By forming the light-shielding function within the semiconductor stack itself (using the n-type InP lower cladding layer and p-type InP upper cladding layer as inherent shielding structures), the need for additional metal film deposition and patternning steps is eliminated, significantly reducing processing difficulty while maintaining extinction ratio performance

Inventive Principle:
Principle #2Taking out (Extraction)

Solution Approach 2:

The patent merges the light-shielding function with the existing semiconductor laser and modulator structures. The n-type InP lower cladding layer and p-type InP upper cladding layer serve dual purposes: as optical confinement layers and as inherent light-shielding structures. This integration eliminates the need for separate light-shielding film processing steps

Inventive Principle:
Principle #5Merging (Combining)

2Reliability

If the light absorption layer contains Bi to suppress hole pile-up, then the extinction ratio is improved, but the manufacturing precision requirements increase

Engineering Contradiction:
Improveextinction ratioVSAvoidcomposition control
Core Design Contradiction:
ReliabilityVSManufacturing precision

Solution Approach 1:

The patent changes the compositional parameter of the light absorption layer by incorporating Bi (bismuth) into the InGaAsP material system. This parameter change fundamentally alters the material's electrical properties, enabling efficient hole extraction that suppresses hole pile-up and maintains high extinction ratio during high-power operation. The Bi content is controlled within a specific range (0.1-5 at%) to achieve the desired effect while managing manufacturing precision

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The patent uses composite material InGaAsPBi (a quaternary alloy containing Bi) for the light absorption layer. This composite material combines the advantages of InGaAsP (optical properties) with Bi (electrical properties for hole extraction), creating a material that simultaneously achieves high extinction ratio and efficient carrier management

Inventive Principle:
Principle #40Composite materials

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This design maintains a high extinction ratio by effectively absorbing scattered light and utilizing heat generated by absorption to reduce the impact of hole pile-up, allowing operation without additional cooling mechanisms and simplifying manufacturing.

Implementation Method 1

a scattered-light absorption layer that faces either a lower surface or an upper surface of the light absorption layer... absorbs the scattered light other than the guided light guided by the optical absorption layer

Methodology Applied
Scientific EffectLight absorption: Absorption (EM radiation)

Implementation Method 2

a light absorption layer configured to absorb the laser light incident from the active layer

Methodology Applied
Scientific EffectLight absorption: Absorption (EM radiation)

Implementation Method 3

utilizing heat generated by absorption to reduce the impact of hole pile-up

Methodology Applied
Scientific EffectHeat generation through light absorption: Heating

Data Source

PatentUS20260005488A1Optical semiconductor device
Publication Date: 2026.01.01 MITSUBISHI ELECTRIC CORP
  • US20260005488A1 patent drawing
  • US20260005488A1 patent drawing
  • US20260005488A1 patent drawing

AI summary

An optical semiconductor device according to the present disclosure having a semiconductor laser section and an optical modulator section formed above a common semiconductor substrate, comprising: the semiconductor laser section including: a first-conductivity-type lower cladding layer; an active layer configured to emit laser light; and a second-conductivity-type upper cladding layer provided with a first-order diffraction grating, which are each made of a group III-V semiconductor compound crystal; and the optical modulator section including: a light absorption layer configured to absorb the laser light incident from the active layer, at least a part of the light absorption layer made of a group III-V semiconductor compound crystal containing Bi; and a scattered-light absorption layer that faces either a lower surface or an upper surface of the light absorption layer, or a pair of scattered-light absorption layers that face the lower surface and the upper surface of the light absorption layer, respectively.