Laser Annealing Optics With Lens Vibration for Uniform Crystallization
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Solution Overview
Problem
Existing laser annealing methods for crystallizing amorphous semiconductor films on substrates face issues with non-uniform energy distribution and equipment costs, particularly due to the inefficiencies of pulsed lasers and the need for precise alignment of crystal structures for high-resolution display panels.
Innovation Solution
A laser irradiation apparatus with vibrating second lenses and an optical element under these lenses to correct the incident angle of the laser beam, ensuring uniform crystallization and reducing crystallization stains, utilizing a galvano mirror and rotatable polygon mirror for precise beam direction control.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a pulsed laser is used for laser annealing, then the crystallization process can be performed, but the oscillation efficiency decreases and energy uniformity deteriorates as usage time increases
Solution Approach 1:
The patent introduces a vibration mechanism that dynamically adjusts the position of the laser beam relative to the second lens during irradiation. This dynamic positioning prevents the laser beam from consistently passing through the same portion of the lens, thereby avoiding localized energy concentration and maintaining energy uniformity even during extended operation.
Solution Approach 2:
The patent employs mechanical vibration of the laser beam path through the second lens. The vibration causes the laser beam to scan across different regions of the lens aperture, preventing energy concentration at any single point and maintaining consistent oscillation efficiency over time.
2Ease of manufacture
If a line beam laser is used for crystallization, then the manufacturing process can be performed, but the equipment cost and maintenance cost increase significantly
Solution Approach 1:
The patent segments the laser beam into multiple spot beams arranged in an array pattern. Instead of using a single expensive line beam laser, multiple lower-cost spot beams are used to cover the same area, achieving the crystallization effect while reducing equipment cost and maintenance requirements.
Solution Approach 2:
The patent replaces the mechanical line beam scanning system with a stationary spot beam array system. The vibration mechanism substitutes for the complex scanning mechanics, simplifying the overall system while maintaining effective crystallization coverage.
3Device complexity
If the laser beam incident angle is not corrected, then the apparatus is simpler, but crystallization stains occur and manufacturing precision deteriorates
Solution Approach 1:
The patent introduces a reflective member as an intermediary component between the second lens and the substrate. This reflective member corrects the incident angle of the laser beam without requiring complex realignment of the entire optical system, maintaining apparatus simplicity while achieving precise crystallization.
Solution Approach 2:
The vibration of the laser beam combined with the reflective member creates a dynamic angle correction mechanism. As the beam vibrates, the reflective member ensures that the incident angle remains optimal across the entire irradiation area, preventing crystallization stains.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively reduces crystallization stains and enables the production of high-resolution display panels by ensuring uniform energy distribution and precise alignment of crystal structures during the laser annealing process.
Implementation Method 1
a laser light source which emits a laser beam
Implementation Method 2
a laser irradiation apparatus used for manufacturing polysilicon... a laser annealing method
Implementation Method 3
a first lens through which the laser beam emitted from the laser light source passes, a plurality of second lenses through which the laser beam deflected by the second scanner passes
Implementation Method 4
a first scanner which reflects the laser beam passing through the first lens and changes a direction of the laser beam, a second scanner which reflects the laser beam deflected by the first scanner and changes a direction of the laser beam
Implementation Method 5
an optical element through which the laser beam passing through the plurality of second lenses passes, where the optical element is configured to correct an incident angle of the laser beam incident a substrate
Data Source
AI summary
A laser irradiation apparatus includes a laser light source which emits a laser beam, a first lens through which the laser beam emitted from the laser light source passes, a first scanner which reflects the laser beam passing through the first lens and changes a direction of the laser beam, a second scanner which reflects the laser beam deflected by the first scanner and changes a direction of the laser beam, a plurality of second lenses through which the laser beam deflected by the second scanner passes, where at least one of the plurality of second lenses is configured to vibrate in one direction, and an optical element through which the laser beam passing through the plurality of second lenses passes, where the optical element is configured to correct an incident angle of the laser beam incident a substrate.