Laser Output Mirror 3D Lithography Beam Collimation
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Solution Overview
Problem
Conventional radiation-emitting components, such as semiconductor lasers, suffer from non-ideal far-field output due to beam divergence and inhomogeneous intensity distribution, which limits their performance.
Innovation Solution
A method involving a 3D lithography process is used to create micro-optics directly on the output mirror of the laser, employing a photoresist layer that is structured to influence the laser radiation's beam path through refraction and reflection, allowing for precise control of the beam path and collimation of the emitted radiation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional semiconductor lasers are used without additional optical elements, then the device complexity is low, but the beam collimation and intensity distribution are non-ideal
Solution Approach 1:
The patent merges the laser gain medium and the optical shaping elements into a single integrated component. The optical structure is formed directly within the semiconductor body using 3D lithography, combining the functions of light generation and beam shaping in one device, thereby improving beam collimation without requiring separate external optical elements
Solution Approach 2:
The patent transitions from conventional 2D surface micro-optics to 3D volumetric optical structures embedded within the semiconductor body. This three-dimensional approach allows for more effective beam collimation and intensity distribution control by manipulating light propagation through the depth of the semiconductor material
2Manufacturing precision
If 3D lithography process is used to create micro-optics on the output mirror, then the beam path control is improved, but the manufacturing process complexity increases
Solution Approach 1:
The 3D lithography process is performed during the semiconductor fabrication sequence, before the laser is operational. The optical structure is pre-formed within the semiconductor body using photomask layers and selective etching, allowing precise beam path control to be built into the device architecture before final assembly and testing
Solution Approach 2:
The patent replaces mechanical alignment of separate optical components with a lithographically-defined optical structure that is inherently aligned to the laser cavity. The photomask patterns and etched features provide automatic geometric alignment, eliminating the need for complex mechanical adjustment mechanisms
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enables the production of radiation-emitting components with improved beam collimation and intensity distribution, enhancing the performance of semiconductor lasers by applying micro-optics with dimensions typically less than 50 μm directly to the output mirror.
Implementation Method 1
The material of the photoresist layer can be chemically modified by an energy transfer, in particular by the absorption of electromagnetic radiation
Implementation Method 2
The optical structure is configured to influence the beam path of the laser radiation by refraction and/or reflection
Implementation Method 3
The optical structure is configured to influence the beam path of the laser radiation by refraction and/or reflection
Data Source
AI summary
The invention relates a method for producing a radiation-emitting component including a step A, in which a laser having an optical resonator and an output mirror is provided, wherein during the intended operation, laser radiation exits the optical resonator via the output mirror. In a step B), a photoresist layer is applied to the output mirror. In a step C), an optical structure is generated from the photoresist layer by means of a 3D lithography method, wherein the optical structure is designed to influence the beam path of the laser radiation by refraction and/or reflection.