Overlapping Laser Irradiation for Precise Pattern Structure Formation

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Solution Overview

Problem

Existing processing apparatuses struggle to accurately form structures on objects using laser light, particularly in forming patterns and patterns with desired orientations and dimensions.

Innovation Solution

A processing apparatus that employs a light irradiation system with a multibeam optical system and movable apparatuses to control the relative positions and orientations of overlapping irradiation areas, allowing for the formation of desired pattern structures by altering the state of overlaps and using a control apparatus to simulate and control the pattern formation process.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If a single laser beam is used to form structures on an object, then the processing apparatus is simple, but the manufacturing precision and productivity are insufficient

Engineering Contradiction:
Improvestructure formation accuracyVSAvoidlight irradiation system complexity
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The patent divides a single laser beam into multiple separate beams using optical elements such as beam splitters or diffractive optical elements. Each beam can be independently directed to different positions on the object, enabling parallel processing of multiple areas simultaneously. This segmentation approach increases manufacturing precision by allowing controlled overlap of irradiation areas while maintaining system complexity at an acceptable level through the use of standard optical components.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The patent combines multiple laser beams into a unified processing system that operates simultaneously on different regions of the object. By merging the functionality of multiple single-beam systems into one apparatus with coordinated beam control, the system achieves higher productivity and precision without proportionally increasing overall device complexity. The beams are coordinated to create overlapping irradiation areas that form precise three-dimensional structures.

Inventive Principle:
Principle #5Merging (Combining)

2Productivity

If multiple laser beams are used to increase processing speed, then the productivity improves, but the control complexity and difficulty of achieving desired patterns increase

Engineering Contradiction:
Improveprocessing speedVSAvoidbeam control system complexity
Core Design Contradiction:
ProductivityVSDevice complexity

Solution Approach 1:

The patent employs dynamic control mechanisms that allow the multiple laser beams to be independently positioned and oriented in real-time. The beam directions and focal points can be dynamically adjusted during processing to create the desired pattern structures. This dynamic control enables high productivity through parallel processing while managing complexity through programmable positioning systems that coordinate beam movements according to pre-planned patterns.

Inventive Principle:
Principle #15Dynamics

Solution Approach 2:

The patent incorporates feedback mechanisms that monitor the positions and intensities of multiple laser beams, adjusting them in real-time to maintain precise overlap and achieve the desired pattern formation. This feedback control reduces the difficulty of pattern creation by automatically compensating for positioning errors and ensuring consistent structure formation across all irradiation areas, thereby maintaining high productivity with controlled complexity.

Inventive Principle:
Principle #23Feedback

3Manufacturing precision

If the irradiation areas are made to overlap to form three-dimensional structures, then the manufacturing precision improves, but the energy consumption and heat generation increase

Engineering Contradiction:
Improvethree-dimensional structure accuracyVSAvoidlaser energy consumption
Core Design Contradiction:
Manufacturing precisionVSUse of energy by moving object

Solution Approach 1:

The patent uses preliminary action by pre-calculating and pre-positioning multiple laser beams to achieve the desired overlapping pattern before actual material processing begins. The beam paths, focal points, and timing are predetermined to ensure optimal overlap for three-dimensional structure formation. This preliminary planning allows the system to achieve high manufacturing precision while minimizing energy waste through efficient beam utilization and reduced redundant irradiation.

Inventive Principle:
Principle #10Preliminary action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Enables precise and efficient formation of pattern structures on objects, including riblet structures, by controlling the irradiation positions and orientations of processing lights, enhancing processing accuracy and efficiency.

Implementation Method 1

a first optical system that divides incident light into first light and second light; a second optical system that returns the first light, which is from the first optical system, to the first optical system as third light; and a third optical system that returns the second light, which is from the first optical system, to the first optical system as fourth light

Methodology Applied
Scientific EffectOptical system light division and return: Reflection

Data Source

PatentUS12539561B2Processing apparatus, processing method and processing system
Publication Date: 2026.02.03 NIKON CORP
  • US12539561B2 patent drawing
  • US12539561B2 patent drawing
  • US12539561B2 patent drawing

AI summary

A processing apparatus is a processing apparatus that irradiates a surface of an object with processing light to process an object and is provided with: a light irradiation apparatus that emits first processing light to form a first irradiation area on the surface and emits second processing light to form a second irradiation area, at least a part of which overlaps with the first irradiation area, on the surface, and has a change member that is configured to change a state of an overlap between the first and second irradiation areas.