In-situ Laser Particle Detection in Semiconductor Processing Chambers
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Solution Overview
Problem
Current methods for identifying particle sources in semiconductor process chambers are labor-intensive and time-consuming, affecting yield and throughput due to the need for extensive design of experiment (DOE) processes to monitor and qualify chamber performance.
Innovation Solution
An in-situ chamber particle source identification method using a laser light source and collector system that scans and analyzes the process volume within the chamber to provide instant particle information, including size, count, and location, allowing for rapid identification of particle sources.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If traditional DOE methods are used to identify particle sources, then particle source identification can be achieved, but the process is very labor and time intensive
Solution Approach 1:
The patent replaces the mechanical DOE process with an optical detection system using laser light sources and photodetectors to detect particles in-situ within the chamber. This substitution of mechanical experimentation with optical sensing enables rapid particle detection without the time-consuming DOE iterations, directly resolving the contradiction between identification accuracy and time consumption
Solution Approach 2:
The chamber equips itself with integrated laser light sources and photodetector arrays that enable self-diagnosis of particle sources. The system performs autonomous particle detection and mapping within the chamber, eliminating the need for external DOE processes and manual substrate analysis, thereby achieving both accurate identification and time efficiency
2Measurement precision
If traditional substrate measurement methods are used to monitor particle performance, then particle count can be measured, but the process is labor intensive and affects throughput
Solution Approach 1:
The system performs preliminary particle detection by scanning the chamber with laser light sources before substrate processing or immediately during processing. This advance detection identifies particle sources proactively, preventing particle contamination of substrates and eliminating the need for post-processing substrate analysis, thereby maintaining both measurement precision and high throughput
Solution Approach 2:
The patent implements continuous particle monitoring using multiple laser light sources and photodetectors that operate continuously during chamber operations. This continuous detection provides real-time particle data without interrupting substrate processing, enabling simultaneous particle measurement and maintenance of chamber productivity
3Loss of time
If in-situ laser scanning is used to identify particle sources, then time to identify particle source is reduced, but device complexity increases
Solution Approach 1:
The detection system is segmented into multiple independent laser light sources and photodetectors positioned at different locations within the chamber. Each sensor pair independently scans a specific region, enabling parallel particle detection across the entire chamber volume. This segmentation achieves rapid comprehensive coverage while keeping each individual sensor component simple and manageable
Solution Approach 2:
The laser light sources and photodetectors serve multiple functions: they detect particles in-situ, map particle sources spatially, and provide real-time feedback for process control. This multi-functionality consolidates what would otherwise require multiple separate systems into a single integrated apparatus, reducing overall device complexity while maintaining rapid particle identification capability
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach significantly reduces the time and resources required to identify particle sources, improving chamber throughput and enabling faster return to manufacturing state and shorter development times.
Implementation Method 1
at least one laser light source can scan laser light in a chamber process volume within the processing chamber
Implementation Method 2
at least one laser light collector can collect laser light emitted from the at least one laser light source
Data Source
AI summary
Broadly speaking, the embodiments of the present invention fill the need by providing an improved chamber particle source identification mechanism. The in-situ chamber particle source identification method and apparatus can greatly shorten the time it takes to identify chamber particle source, which could improve the chamber throughput for production system. The method and apparatus can also be used to test components for particle performance during chamber engineering development stage. In one embodiment, an in-situ chamber particle monitor assembly for a semiconductor processing chamber includes at least one laser light source. The at least one laser light source can scan laser light in a chamber process volume within the processing chamber. The in-situ chamber particle monitor assembly also includes at least one laser light collector. The at least one laser light collector can collect laser light emitted from the at least one laser light source. The chamber particle monitor assembly also includes an analyzer external to the processing chamber that analyzes signals representing the laser light collected by the at least one laser light collector to provide chamber particle information.