Laser Pattern Mask Protective Film for Layer Patterning

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Solution Overview

Problem

The laser pattern mask is prone to damage and reduced laser shielding capability when patterning an entire layer on a mother substrate at once, leading to stitching errors and increased tack time, which negatively impacts yield in flat display device production.

Innovation Solution

A laser pattern mask with a base substrate and a laser shielding pattern made of opaque metals like Al, Ag, or Au, coated with a protective film such as MgF2 or SiO2 to prevent damage from laser energy and oxygen exposure, allowing for simultaneous patterning of layers without compromising the mask's integrity.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If the entire layer on the mother substrate is patterned at a time using laser ablation, then productivity is improved, but the laser shielding pattern on the mask is damaged

Engineering Contradiction:
Improvepatterning speedVSAvoidmask integrity
Core Design Contradiction:
ProductivityVSReliability

Solution Approach 1:

A protective film (intermediary layer) is introduced between the laser beam and the laser shielding pattern. This film absorbs or reflects the laser energy, preventing direct interaction with the metal pattern while still allowing the patterning function to occur. The protective film acts as a mediator that protects the mask structure during high-power laser ablation processes.

Inventive Principle:
Principle #24Intermediary (Mediator)

Solution Approach 2:

The protective film is applied in advance to the laser shielding pattern before the laser ablation process begins. This pre-protection measure ensures that when the high-energy laser beam is applied for simultaneous patterning, the mask structure is already cushioned against damage, enabling high-speed processing without compromising mask integrity.

Inventive Principle:
Principle #11Beforehand cushioning (Prior cushioning)

2Reliability

If the laser shielding pattern is made of opaque metal for effective laser blocking, then laser shielding capability is improved, but the mask is prone to damage from laser energy and oxidation

Engineering Contradiction:
Improvelaser shielding capabilityVSAvoidlaser energy damage and oxidation
Core Design Contradiction:
ReliabilityVSObject-affected harmful factors

Solution Approach 1:

The mask structure is transformed from a single material (opaque metal) to a composite structure consisting of the metal laser shielding pattern combined with a protective film layer. This composite design maintains the laser-blocking capability of the metal while adding the protective properties of the film material that resists laser energy damage and oxidation.

Inventive Principle:
Principle #40Composite materials

Solution Approach 2:

The protective film creates an inert barrier environment around the laser shielding pattern, preventing direct contact between the metal surface and oxygen in the atmosphere. This eliminates oxidation reactions that would otherwise degrade the mask performance, while the film itself is designed to be resistant to laser energy.

Inventive Principle:
Principle #39Inert atmosphere (Inert environment)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The solution effectively prevents damage to the laser pattern mask and maintains its shielding capability, reducing tack time and improving yield by reflecting laser energy and minimizing oxidation reactions, thus enabling efficient patterning of multiple layers at once.

Implementation Method 1

The solution effectively prevents damage to the laser pattern mask and maintains its shielding capability, reducing tack time and improving yield by reflecting laser energy

Methodology Applied
Scientific EffectReflection: Reflection

Implementation Method 2

coated with a protective film such as MgF2 or SiO2 to prevent damage from laser energy and oxygen exposure

Methodology Applied
Scientific EffectOxidation: Oxidation

Data Source

PatentUS8409771B2Laser pattern mask and method for fabricating the same
Publication Date: 2013.04.02 SAMSUNG DISPLAY CO LTD
  • US8409771B2 patent drawing
  • US8409771B2 patent drawing
  • US8409771B2 patent drawing

AI summary

The present invention relates to a laser pattern mask, and a method for fabricating the same, which can prevent a laser pattern mask from being damaged by coating a protective film on a surface of a laser pattern mask for patterning an entire layer on a mother substrate at a time by laser ablation. The laser pattern mask includes a base substrate, a laser shielding pattern formed of a non-transparent metal on the base substrate to define laser pass through regions, and a protective film formed on an entire surface of the base substrate including the laser shielding pattern.