Laser Processing Apparatus with Beam Gap Adjustor for Shadow Masks
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Solution Overview
Problem
Current laser processing methods for manufacturing shadow masks, especially for OLED displays, face challenges in achieving uniform patterns and varying resolutions due to limitations in wet etching and fixed beam gaps when using single laser beams or diffractive optical elements.
Innovation Solution
A laser processing apparatus that includes a diffractive optical element and a beam gap adjustor with an anamorphic and zoom optical system, allowing for adjustable gaps between sub-laser beams in multiple directions, along with aberration correction systems to improve focusing and processing speed.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If a single laser beam is used for processing, then the equipment structure is simple, but the processing time is excessively long
Solution Approach 1:
The patent divides a single laser beam into multiple sub-laser beams using a diffractive optical element (DOE). This segmentation allows parallel processing of multiple shadow mask patterns simultaneously, dramatically increasing processing speed while maintaining relatively simple equipment structure.
Solution Approach 2:
The patent makes the laser processing apparatus capable of processing shadow masks with various resolutions by adjusting the gap between sub-laser beams. The same apparatus can handle different pattern densities (from 100 lines/inch to 600 lines/inch) without requiring separate equipment, achieving multi-functionality.
2Productivity
If a diffractive optical element is used to divide the laser beam into multiple sub-laser beams, then processing speed increases, but the gap between beams is fixed and cannot accommodate various resolutions
Solution Approach 1:
The patent introduces a beam gap adjustor that dynamically changes the gap between sub-laser beams. This allows the system to adapt to different resolution requirements by adjusting beam spacing, transforming the fixed-gap limitation into a variable-gap capability while maintaining high processing speed.
Solution Approach 2:
The patent changes the spatial parameter (gap distance) between sub-laser beams to accommodate different resolution requirements. By adjusting this parameter, the same multi-beam system can process patterns ranging from coarse to fine resolutions without sacrificing processing speed.
3Adaptability or versatility
If the gap between sub-laser beams is fixed, then the optical system is simple, but it is difficult to manufacture shadow masks with various resolutions
Solution Approach 1:
The patent introduces a beam gap adjustor as an intermediary component between the DOE and the shadow mask. This intermediary device enables flexible gap adjustment without fundamentally changing the optical system architecture, achieving resolution variety with controlled complexity increase.
4Manufacturing precision
If wet etching is used to manufacture shadow masks, then the process is simple, but the pattern uniformity is poor and side surface shape is limited
Solution Approach 1:
The patent replaces the chemical wet etching process with a laser-based mechanical/thermal processing method. This substitution achieves superior pattern uniformity and vertical side surface formation while maintaining manufacturing feasibility through automated laser processing.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables rapid production of shadow masks with various resolutions by dynamically adjusting beam gaps and correcting aberrations, enhancing processing speed and pattern precision.
Implementation Method 1
a diffractive optical element (DOE) that divides the laser beam that is generated by the laser generator into a plurality of sub-laser beams
Implementation Method 2
The anamorphic optical system may include a pair of prism lenses
Implementation Method 3
an aberration correction optical system that corrects an aberration according to a relative position between ones of the plurality of sub-laser beams
Data Source
AI summary
A laser processing apparatus includes: a laser generator that generates a laser beam, a diffractive optical element that divides the laser beam generated by the laser generator into a plurality of sub-laser beams, and a beam gap adjustor that adjusts a gap between neighboring ones of the plurality of sub-laser beams. Therefore, by installing a diffractive optical element that divides a laser beam that is generated by the laser generator into the plurality of sub-laser beams and a beam gap adjustor to adjust a gap between a plurality of sub-laser beams, the laser processing apparatus can form a processing pattern of various resolutions in a shadow mask while improving a processing speed of the shadow mask.