Laser Profiler Fixture for Precise Reaction Chamber Target Positioning
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Solution Overview
Problem
Existing semiconductor processing systems face challenges in accurately determining the position of targets within reaction chambers, leading to variations in film deposition properties due to deviations in gas flow patterns and thermal conditions caused by misalignment or decentering of substrates and chamber structures.
Innovation Solution
A fixture comprising a frame, leveling plate, bracket, and laser profiler is used to determine the position of targets within reaction chambers, employing a laser profiler to project a line onto the target and acquire height measurements, allowing for precise positioning of components like shelves, one-piece rings, and susceptors.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If traditional positioning methods are used for targets in reaction chambers, then the system structure remains simple, but the position determination accuracy is insufficient leading to film deposition variations
Solution Approach 1:
The patent replaces traditional mechanical positioning methods with a laser-based optical measurement system. The laser profiler projects laser lines onto the target and uses optical sensors to detect position, eliminating the need for complex mechanical alignment mechanisms while achieving high measurement precision.
Solution Approach 2:
The patent introduces a laser profiler as an intermediary device between the measurement system and the target. The laser profiler serves as a mediator that projects reference lines and enables non-contact position determination, simplifying the overall system while improving accuracy.
2Manufacturing precision
If manual positioning of substrates and chamber structures is used, then the device complexity remains low, but the manufacturing precision of film deposition is compromised due to decentering and misalignment
Solution Approach 1:
The patent implements preliminary positioning by projecting laser lines onto the target before the actual film deposition process. This allows operators to verify and adjust the position of substrates and chamber structures in advance, ensuring proper alignment and preventing decentering issues during deposition.
Solution Approach 2:
The patent establishes a feedback mechanism where the laser profiler continuously monitors the position of targets and provides real-time position data. This feedback enables dynamic adjustment of substrate and chamber structure positions to maintain manufacturing precision throughout the film deposition process.
3Reliability
If no position verification system is implemented, then the system remains simple and quick to operate, but the reliability of film deposition properties cannot be ensured
Solution Approach 1:
The patent enables the system to self-verify its own positioning accuracy through the laser profiler. The system automatically projects laser lines, detects target positions, and provides position verification without requiring additional manual measurement tools or complex operational procedures, maintaining ease of operation while ensuring reliability.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution enables accurate determination of target positions, reducing variations in film deposition properties by ensuring consistent gas flow and thermal conditions, thereby improving the quality and consistency of film deposition processes.
Implementation Method 1
The laser profiler is suspended from the bracket, overlays the reaction chamber, and has a field of view extending through the leveling plate and the frame to determine position of a target within the reaction chamber
Data Source
AI summary
A fixture includes a frame, a leveling plate, a bracket, and a laser profiler. The frame is arranged for fixation above a reaction chamber arranged to deposit a film onto a substrate. The leveling plate is supported on the frame. The bracket is supported on the leveling plate. The laser profiler is suspended from the bracket, overlays the reaction chamber, and has a field of view that extends through the leveling plate and the frame to determine position of a target within the reaction chamber. Semiconductor processing systems and methods of determining position of targets within reaction chambers in semiconductor processing systems are also described.