Laser Sensor Monitoring Deposition Chamber Dome
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Solution Overview
Problem
Current semiconductor device fabrication processes face challenges in accurately monitoring and controlling the internal state of deposition chambers, particularly due to incomplete cleaning methods that affect the transmission of radiant heat energy and lead to inefficiencies and failures in the deposition process.
Innovation Solution
A deposition process monitoring system utilizing a transparent cover dome, lamps for radiant heat energy, and laser sensors to detect the intensity of laser beams transmitted through the dome, allowing for real-time monitoring of by-products and adjustment of process conditions to maintain optimal chamber states.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If a transparent cover dome is used to enable optical monitoring, then measurement capability is improved, but by-products accumulate on the dome surface reducing laser beam transmission intensity
Solution Approach 1:
The system performs periodic cleaning of the cover dome at predetermined intervals during the deposition process. The cleaning unit activates periodically to remove accumulated by-products from the dome surface, restoring laser beam transmission intensity and maintaining measurement accuracy throughout the deposition cycle.
Solution Approach 2:
The laser sensor continuously monitors the intensity of laser beams transmitted through the cover dome. When the transmitted intensity falls below a predetermined threshold, indicating by-product accumulation, the system automatically triggers the cleaning unit to restore transmission, creating a closed-loop feedback control system.
2Productivity
If the deposition process continues without cleaning, then productivity is improved, but temperature measurement errors increase due to by-product accumulation
Solution Approach 1:
The system performs cleaning actions in advance before by-product accumulation significantly degrades measurement accuracy or process performance. By proactively cleaning the dome at predetermined intervals or when threshold values are approached, the system prevents measurement errors while maintaining continuous deposition operations.
Solution Approach 2:
The laser sensor provides continuous feedback on the transmission intensity through the cover dome. This feedback mechanism enables the system to automatically initiate cleaning operations when by-product accumulation reaches critical levels, ensuring temperature measurement accuracy is maintained throughout the deposition process.
3Measurement precision
If frequent cleaning is performed to maintain measurement accuracy, then measurement precision is improved, but productivity decreases due to process interruptions
Solution Approach 1:
The system implements periodic cleaning at predetermined intervals that balance measurement accuracy requirements with productivity maintenance. By optimizing the cleaning frequency and duration, the system achieves adequate by-product removal while minimizing interruptions to the deposition process, thereby maintaining both measurement precision and productivity.
Solution Approach 2:
The system monitors the transmission intensity parameter and dynamically adjusts cleaning frequency based on actual by-product accumulation rates. When accumulation is slow, cleaning intervals are extended; when accumulation is rapid, cleaning frequency increases. This adaptive parameter adjustment optimizes the balance between measurement accuracy and productivity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This system enables accurate detection of by-product states, reduces temperature measurement errors, and improves the efficiency and reliability of the deposition process, thereby enhancing the production of semiconductor devices by minimizing failures and optimizing process conditions.
Implementation Method 1
a first laser sensor disposed outside the chamber, the first laser sensor configured to irradiate the cover dome with a laser beam and detect an intensity of the laser beam transmitted through the cover dome
Implementation Method 2
a plurality of lamps disposed in the facility cover, the lamps respectively disposed at an upper portion and a lower portion of the chamber, and the lamps configured to supply radiant heat energy into the chamber during a deposition process
Data Source
AI summary
Provided are a deposition process monitoring system capable of detecting an internal state of a chamber in a deposition process, and a method of controlling the deposition process and a method of fabricating a semiconductor device using the system. The deposition process monitoring system includes a facility cover configured to define a space for a deposition process, a chamber located in the facility cover, covered with a translucent cover dome, and having a support on which a deposition target is placed, a plurality of lamps disposed in the facility cover, the lamps respectively disposed above and below the chamber, the lamps configured to supply radiant heat energy into the chamber during the deposition process, and a laser sensor disposed outside the chamber, the laser sensor configured to irradiate the cover dome with a laser beam and detect an intensity of the laser beam transmitted through the cover dome, wherein a state of by-products with which the cover dome is coated is determined based on the detected intensity of the laser beam.