Laser-Modulated Substrate Heating for Uniform Etching Profiles
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Solution Overview
Problem
The challenge of achieving uniform temperature distribution and desired shape in substrate processing due to blurring and non-uniform etching caused by laser beam modulation with Digital Micro-mirror Devices (DMDs) results in non-uniform etching of substrates.
Innovation Solution
A substrate processing method and apparatus using a Digital Micro-mirror Device (DMD) to modulate laser beams, adjusting the ON/OFF states of micromirrors to control the shape and distribution of laser beams, converting Gaussian-type beams to flat top-type, and selectively emitting laser beams to achieve uniform temperature distribution and desired patterns on substrates.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a laser beam with flat top distribution is modulated through a DMD and emitted to a specific area to uniformly heat the area, then the desired shape etching should be achieved, but uniform temperature distribution is not formed due to blurring in the edge region of light
Solution Approach 1:
The patent applies local quality by differentiating the laser intensity distribution across different regions of the irradiated area. Specifically, the laser beam is designed with higher intensity at the center region and lower intensity at the edge regions. This non-uniform local intensity distribution compensates for the blurring effect at edges, ensuring that even with light diffusion, the temperature distribution remains uniform across the entire irradiated area, thereby achieving precise etching shapes.
Solution Approach 2:
The patent employs parameter changes by modifying the intensity distribution parameter of the laser beam. Instead of using a uniform flat top distribution, the laser intensity is varied spatially with higher values at the center and lower values at the edges. This parameter adjustment compensates for the blurring effect during light emission, maintaining uniform temperature distribution and achieving the desired etching precision.
2Adaptability or versatility
If light is emitted to heat a specific area of substrate, then etching can be controlled in various ways, but the edge region of light causes blurring and non-uniform temperature distribution
Solution Approach 1:
The patent applies local quality by differentiating the laser intensity distribution across different regions of the irradiated area. Specifically, the laser beam is designed with higher intensity at the center region and lower intensity at the edge regions. This non-uniform local intensity distribution compensates for the blurring effect at edges, ensuring that even with light diffusion, the temperature distribution remains uniform across the entire irradiated area, thereby achieving precise etching shapes.
Solution Approach 2:
The patent applies preliminary anti-action by pre-compensating for the expected blurring effect at light edges through intentional intensity reduction at edge regions before light emission. This preliminary adjustment counteracts the adverse effect of light diffusion, preventing non-uniform temperature distribution and maintaining etching precision throughout the process.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables effective substrate processing by ensuring uniform temperature distribution and precise control over etching, allowing for accurate adjustment of critical dimensions and patterns on substrates.
Implementation Method 1
heating a specific area of the substrate by emitting a laser beam
Implementation Method 2
modulating the laser beam using a light modulation unit... adjusting a direction in which the micromirrors each reflect the laser beam
Data Source
AI summary
The present invention provides a substrate treatment method. The substrate processing method includes: a processing liquid supply step of supplying processing liquid to a substrate; and a heating step of heating a specific area of the substrate by emitting a laser beam, which is generated from a laser source, to the substrate, wherein the heating step may include: a laser modulation step of modulating the laser beam using a light modulation unit; and a laser emission step of emitting the laser beam modulated by the light modulation unit to the specific area.