Laser Thermal Imaging Mask for OLED Transfer Defects
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Solution Overview
Problem
Conventional laser-induced thermal imaging methods for organic light-emitting display manufacturing suffer from transfer defects, such as stitch defects, due to limitations in laser beam width and length, which prevent complete transfer in one scanning pass across a substrate.
Innovation Solution
A laser-induced thermal imaging apparatus with a substrate support unit and a laser beam irradiation unit that moves relative to each other, utilizing a linear laser beam and a mask with adjustable openings to control the exposure and shielding of the laser beam, ensuring uniform thermal distribution and minimizing transfer defects by scanning in a direction non-perpendicular to the beam's length.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a conventional laser beam is used with limited width and length, then the device complexity is reduced, but transfer defects occur due to inability to complete transfer in one scanning pass
Solution Approach 1:
The laser beam is segmented into multiple linear segments arranged in an array, allowing the beam to cover a larger area and complete the transfer process in a single scanning pass, thereby eliminating stitch defects and improving transfer accuracy
Solution Approach 2:
The laser beam is transformed from a single-point or single-line source into a two-dimensional array of linear beam segments, enabling simultaneous irradiation across the entire substrate width and eliminating the need for multiple sequential scanning passes
2Area of stationary object
If multiple scanning passes are performed to cover the entire substrate, then the laser beam width limitation is worked around, but stitch defects occur at the boundaries between scanned areas
Solution Approach 1:
Multiple linear laser beam segments are merged into a single array structure that operates simultaneously, combining their coverage areas to achieve complete substrate coverage in one pass without creating boundary defects between scanned regions
3Productivity
If the laser beam irradiates the entire substrate in one pass, then transfer completeness is improved, but unnecessary irradiation increases energy consumption
Solution Approach 1:
The laser beam array is configured with selectively controllable segments that can be independently activated or deactivated, allowing the system to irradiate only the specific regions requiring transfer while avoiding unnecessary energy consumption in already-transferred or non-target areas
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively reduces transfer defects by ensuring uniform thermal distribution and preventing unnecessary laser beam irradiation, allowing for complete and accurate transfer of the light-emitting layer in a single pass, thereby enhancing the manufacturing process for organic light-emitting displays.
Implementation Method 1
The LITI method is a method of converting a laser beam irradiated from a light source into heat energy, and forming a pattern by transferring a light-emitting layer, and other elements to a substrate using the heat energy
Data Source
AI summary
A laser-induced thermal imaging apparatus includes a substrate support unit and a laser beam irradiation unit. The substrate support unit and the laser beam irradiation unit move relative to each other so that the substrate arranged on the substrate support unit is scanned in one direction by a laser beam irradiated from the laser beam irradiation unit. The laser beam irradiation unit includes a beam generation unit, a first mask arranged on a path of the linear laser beam generated in the beam generation unit, the first mask including a plurality of openings arranged along a length direction of the linear laser beam, and a shield unit movable to expose all of the plurality of openings of the first mask or to shield at least some of the plurality of the openings of the first mask.