Laser Transfer Scanning Control to Prevent Irradiation Hotspots
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Solution Overview
Problem
Existing transfer devices risk damaging elements due to excessive concentration of laser-irradiated points, particularly during acceleration and deceleration, leading to potential cracks and damage.
Innovation Solution
A transfer device that intermittently emits active energy rays and adjusts the irradiation time intervals based on the movement speed and direction of the irradiation position, using an irradiation position control unit and an optional irradiation prevention unit to prevent excessive concentration of irradiated points.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Speed
If the reflection means performs a turnaround action to change the irradiation position, then the element can be transferred across the substrate, but the movement speed decreases causing excessive concentration of laser-irradiated points
Solution Approach 1:
The patent applies dynamics by making the laser emission interval variable rather than fixed. The control unit dynamically adjusts the emission interval based on the instantaneous movement speed of the irradiation position, ensuring that the time between consecutive laser shots adapts to the changing speed conditions during acceleration and deceleration phases.
Solution Approach 2:
The patent changes the parameter of laser emission interval based on movement speed. By establishing a relationship between the emission interval and the movement speed of the irradiation position, the system adjusts the timing parameter to prevent excessive concentration of irradiated points while maintaining transfer efficiency.
2Productivity
If the laser irradiation is continuous to ensure complete element transfer, then the transfer efficiency is maintained, but elements may be damaged at locations with concentrated irradiation points
Solution Approach 1:
The patent implements feedback by having the control unit continuously monitor the movement speed of the irradiation position and use this information to adjust the laser emission interval. This closed-loop control ensures that the laser irradiation pattern adapts to real-time motion conditions, preventing harmful concentration of irradiation points while maintaining effective transfer.
Solution Approach 2:
The system dynamically adjusts the laser emission characteristics based on real-time movement conditions. By making the emission interval variable rather than fixed, the system optimizes the balance between transfer efficiency and element protection, emitting laser pulses more frequently when movement is fast and less frequently when movement slows down.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Prevents excessive concentration of laser-irradiated points, thereby reducing damage to elements during transfer, especially during acceleration and deceleration.
Implementation Method 1
a laser light source for generating a laser beam
Implementation Method 2
a reflection means for reflecting the laser beam from the laser light source in a required direction
Implementation Method 3
laser is irradiated on a bonding surface of a chip bonded to a transfer substrate to cause ablation, which causes the chip to detach from the transfer substrate
Data Source
Figure 1
Figure 2(a)~2(b)
Figure 3(a)~3(b)
AI summary
To provide a transfer device that can prevent an excessive concentration of points irradiated with active energy rays. Specifically, provided is a transfer device 10 that irradiates a transfer substrate 22 with active energy rays 11 to transfer an element 21 held by the transfer substrate 22 onto a receiving substrate 23, the transfer device 10 comprising an energy emission unit 12 that intermittently emits active energy rays 11, and an irradiation position control unit 15 that controls the irradiation position of the active energy rays 11 emitted from the energy emission unit with 12 respect to the transfer substrate 22, wherein a time interval for the irradiation of the active energy rays onto the transfer substrate 22 is adjusted in accordance with the movement speed of the irradiation position of the active energy rays 11 on the transfer substrate 22, as controlled by the irradiation position control unit 15.