Laser Treatment Rectifier Device for Stable Gas Atmosphere
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Solution Overview
Problem
Conventional laser treatment devices face issues with turbulent gas flows causing non-uniform laser light irradiation and difficulty in exhausting substances like Si steam or fine particles from the substrate, leading to fluctuations in gas pressure and temperature, which hinder uniform treatment.
Innovation Solution
A laser treatment device with a rectifier device that includes a gas supply unit and a gas exhaust unit positioned separately from the light-transmitting region, creating a uniform gas flow and pressure distribution to generate a stable local gas atmosphere, and a rectifier surface extending outward to prevent turbulent flows and facilitate efficient gas suction.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Quantity of substance
If gas is continuously ejected from around the laser light path toward the substrate, then a gas atmosphere is generated, but turbulent flow occurs in the position to be irradiated with laser light causing non-uniform laser light irradiation
Solution Approach 1:
The gas supply and exhaust functions are segmented into separate units positioned at different locations. The gas supply unit introduces gas at positions separated from the light-transmitting region, while the gas exhaust unit removes gas at different positions, creating a controlled flow path that prevents turbulence in the laser irradiation area while maintaining gas atmosphere generation.
Solution Approach 2:
A rectifier with a rectifier surface is introduced as an intermediary component between the gas supply and the substrate. This rectifier surface, which extends along the plate surface of the target object and outward from the light-transmitting region, guides and straightens the gas flow, converting turbulent flow into laminar flow before the gas reaches the laser irradiation position.
2Stability of the object's composition
If gas flow rate is decreased to ease turbulent flow, then turbulent flow is reduced, but it becomes difficult to achieve uniform atmosphere generation
Solution Approach 1:
The invention changes the spatial parameters of gas supply and exhaust positions, separating them from the light-transmitting region. By adjusting the positions where gas is supplied and exhausted (both separated from the light-transmitting region), the system maintains adequate gas flow rate for uniform atmosphere generation while the rectifier surface ensures the flow remains laminar rather than turbulent.
3Manufacturing precision
If laser light irradiation causes Si steam or fine particles to occur from substrate, then treatment is performed, but optical refraction index changes and laser light is blocked
Solution Approach 1:
The gas exhaust unit is specifically designed to extract and remove harmful substances (Si steam and fine particles) generated during laser irradiation. By positioning the exhaust unit to suction gas from positions separated from the light-transmitting region, the system effectively removes blocking substances from the laser path while maintaining the treatment process.
4Ease of operation
If rectifier plates are positioned close to substrate, then gas flow control is improved, but turbulent flow occurs when gas hits the substrate
Solution Approach 1:
The rectifier surface extends not only in the vertical dimension but also horizontally along the plate surface of the target object and outward from the light-transmitting region. This multi-dimensional extension creates a flow guidance structure that directs gas flow parallel to the substrate surface rather than allowing direct impact, preventing turbulence while maintaining effective gas flow control.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution ensures a stable laminar gas flow around the irradiated region, allowing for uniform laser light irradiation and effective removal of substances from the substrate, enhancing the quality of treatment by preventing turbulent flows and maintaining a stable atmosphere.
Implementation Method 1
a stable laminar gas flow around the irradiated region
Implementation Method 2
a gas exhaust unit that exhausts, on the other side that is on the other side of the light-transmitting region from the one side, the gas present in a gap between the rectifier surface and the target object from the gap
Implementation Method 3
a rectifier surface separated from the target object and extending along the plate surface of the target object and outward from the light-transmitting region
Implementation Method 4
performing treatment by irradiating a target object having a plate surface with laser light
Data Source
AI summary
A laser treatment device performing treatment by irradiating a target object having a plate surface with laser light, including: a light-transmitting region transmitting laser light emitted onto the target object; a rectifier that has a rectifier surface separated from the target object and extending along the plate surface of the target object and outward from the end of the light-transmitting region; a gas supply unit that feeds a gas to a gap between one side of the rectifier surface and the light-transmitting region, in a position separated from the light-transmitting region; and a gas exhaust unit that exhausts, on the other side that is on the other side of the light-transmitting region from the one side, the gas present in a gap between the rectifier surface and the target object from the gap, in a position separated from the light-transmitting region, thereby generating a stable local gas atmosphere.