Laser Wafer Placement Teaching for Oversized Electrostatic Chucks

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Solution Overview

Problem

Existing methods for wafer placement on electrostatic chucks are inadequate when the wafer has a larger area than the chuck, making precise positioning difficult.

Innovation Solution

An apparatus and method using laser distance sensors to measure and adjust the relative positions of the wafer and electrostatic chuck, ensuring accurate placement even when the wafer is larger, involving a controller and robot for precise alignment.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Adaptability or versatility

If traditional light receiving area methods are used on the electrostatic chuck, then wafer position teaching is accurate when the chuck is larger than the wafer, but the method becomes difficult to apply when the wafer is larger than the electrostatic chuck

Engineering Contradiction:
Improveapplicability to different wafer-chuck size relationshipsVSAvoidwafer placement accuracy
Core Design Contradiction:
Adaptability or versatilityVSManufacturing precision

Solution Approach 1:

The patent introduces a laser distance sensor as an intermediary measurement tool that bridges the gap between the electrostatic chuck and the wafer. Instead of relying on the chuck's light receiving area, the laser sensor measures distances to both the chuck edge and wafer edge, enabling position calculation through mathematical relationships. This intermediary measurement system allows accurate teaching regardless of whether the wafer is smaller or larger than the chuck.

Inventive Principle:
Principle #24Intermediary (Mediator)

2Adaptability or versatility

If the electrostatic chuck has a larger area than the wafer, then traditional teaching methods work well, but these methods fail when the wafer area exceeds the chuck area

Engineering Contradiction:
Improvemethod applicability across different configurationsVSAvoidteaching operation reliability
Core Design Contradiction:
Adaptability or versatilityVSReliability

Solution Approach 1:

The laser distance sensor system performs multiple functions: it measures distances to determine both the chuck's position and the wafer's position, calculates relative positions, and enables teaching operations. This universal measurement approach works regardless of the size relationship between wafer and chuck, making the system reliable across all configuration scenarios.

Inventive Principle:
Principle #6Universality (Multi-functionality)

3Manufacturing precision

If laser distance sensors are used to measure positions, then accurate wafer positioning is achieved even when wafer is larger than chuck, but additional measurement and calculation steps are required

Engineering Contradiction:
Improvewafer placement precisionVSAvoidmeasurement and control system complexity
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The patent replaces traditional mechanical or optical teaching systems with a laser distance sensor-based measurement system. The laser sensor optically measures distances without physical contact, and the controller automatically calculates positions using these measurements. This substitution eliminates the need for physical teaching tools or complex mechanical alignment mechanisms, achieving high precision with a relatively simple system.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Enables accurate wafer positioning by determining and correcting the relative positions of the wafer and electrostatic chuck, ensuring concentric alignment and precise placement.

Implementation Method 1

a laser distance sensor disposed above the electrostatic chuck

Methodology Applied
Scientific EffectLaser: Laser

Data Source

PatentUS12411003B2Apparatus for wafer placement teaching and method for wafer placement teaching using the same
Publication Date: 2025.09.09 SYSTEM ENGINEERING MEGA SOLUTION CO LTD
  • US12411003B2 patent drawing
  • US12411003B2 patent drawing
  • US12411003B2 patent drawing

AI summary

Proposed are a wafer position detection apparatus and a wafer position detection and correction method using the same. More specifically, proposed is an apparatus for wafer placement teaching for adjusting a position of a wafer disposed on an electrostatic chuck, the apparatus including a laser distance sensor disposed above the electrostatic chuck, and a controller configured to control a robot configured to transfer the wafer. The controller checks a relative position of the electrostatic chuck and the wafer disposed on the electrostatic chuck using the laser distance sensor so that the wafer is transferred to a predetermined position, and teaches the position of the wafer using the checked relative position of the electrostatic chuck and the wafer.