Layer Deposition Pretreatment for Uniform Nucleation Layers
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Solution Overview
Problem
The existing methods for forming layers on substrates in semiconductor device manufacturing lack the necessary uniformity and quality, particularly in the nucleation layer, which affects the subsequent deposition of layers.
Innovation Solution
A method and apparatus that involve sequentially repeating a deposition cycle with a pretreatment period longer than the pulse periods for the precursors, allowing byproducts to uniformly spread and prepare the surface for improved nucleation layer uniformity, comprising supplying a first precursor for a pulse period, removing it, then supplying a second precursor for another pulse period, and repeating this process with extended pretreatment to enhance layer uniformity.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If the deposition cycle is repeated sequentially without extended pretreatment, then the deposition process is faster, but the uniformity of the nucleation layer deteriorates
Solution Approach 1:
The patent applies preliminary action by extending the pretreatment period before the actual deposition cycles. During this extended pretreatment, byproducts are allowed to accumulate and uniformly distribute in the reaction chamber, preparing the environment for subsequent deposition. This preliminary preparation ensures uniform nucleation layer formation without compromising deposition productivity.
2Manufacturing precision
If the pretreatment period is extended longer than pulse periods, then the uniformity of the nucleation layer is improved, but the total deposition time increases
Solution Approach 1:
The patent applies parameter changes by optimizing the duration of the pretreatment period relative to the pulse periods. By carefully controlling the pretreatment time to be longer than the pulse periods, the process achieves uniform byproduct distribution and improved nucleation layer uniformity while minimizing the overall time penalty. This parameter optimization balances quality improvement with time efficiency.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach improves the uniformity and quality of the deposited layers by ensuring better distribution of byproducts during the pretreatment period, leading to enhanced nucleation layer uniformity and overall layer quality, even when processing multiple substrates simultaneously.
Implementation Method 1
a silicon halide molecule may chemisorb on a surface site that has a hydroxyl group
Implementation Method 2
the substrate may be exposed to a pulse of a second precursor reactant, which chemically reacts with the adsorbed portion of the first precursor reactant molecules
Implementation Method 3
the byproduct may be more uniformly spread through the reaction chamber
Data Source
AI summary
There is provided a method and apparatus for forming a layer, by sequentially repeating a layer deposition cycle to process a substrate disposed in a reaction chamber. The deposition cycle comprising:supplying a first precursor into the reaction chamber for a first pulse period;supplying a second precursor into the reaction chamber for a second pulse period. At least one of the first and second precursors may be supplied into the reaction chamber for a pretreatment period longer than the first or second pulse period before sequentially repeating the deposition cycles.