Layout Checking System for Semiconductor Circuit Verification

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Solution Overview

Problem

In semiconductor fabrication, existing methods face challenges in efficiently assigning multiple-layout patterns to different groups for enhanced spatial resolution, leading to inconsistencies in layout designs and potential errors in circuit verification.

Innovation Solution

A design system that includes a processor and memory for executing program codes to check and manage layout patterns, utilizing netlist files and layout constraints to ensure consistency and adherence to design rules, thereby automating the assignment of multiple-layout patterns to terminals in semiconductor circuits.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If multiple-layout patterns are manually assigned to different groups by circuit designers, then spatial resolution of the layer is increased, but layout design consistency deteriorates and errors in circuit verification increase

Engineering Contradiction:
Improvespatial resolutionVSAvoidlayout design consistency
Core Design Contradiction:
Manufacturing precisionVSReliability

Solution Approach 1:

The system performs self-verification by automatically checking layout patterns against design rules and constraints. The layout checking system autonomously identifies inconsistencies and errors without requiring manual intervention, thereby maintaining design consistency while enabling the use of multiple-layout patterns for enhanced spatial resolution.

Inventive Principle:
Principle #25Self-service

Solution Approach 2:

The system provides feedback by comparing actual layout patterns with predetermined design rules and constraints. This feedback mechanism identifies deviations and errors in layout assignments, allowing designers to correct inconsistencies and maintain reliability when using multiple-layout patterns for improved spatial resolution.

Inventive Principle:
Principle #23Feedback

2Manufacturing precision

If multiple-layout patterns are used to enhance spatial resolution, then manufacturing precision is improved, but device complexity increases

Engineering Contradiction:
Improvespatial resolutionVSAvoidlayout pattern management
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The system segments layout patterns into distinct groups that can be independently managed and verified. By dividing the complex multiple-layout pattern assignment into manageable segments with specific design rules, the system maintains precision while reducing the perceived complexity through structured organization.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The layout checking system serves multiple functions: it verifies layout patterns against design rules, checks consistency across different layout groups, identifies errors, and provides feedback. This multi-functional approach consolidates various verification tasks into a single system, managing complexity while maintaining precision.

Inventive Principle:
Principle #6Universality (Multi-functionality)

3Adaptability or versatility

If manual assignment of layout patterns is performed, then flexibility in design is maintained, but productivity decreases due to time-consuming verification processes

Engineering Contradiction:
Improvedesign flexibilityVSAvoidlayout verification efficiency
Core Design Contradiction:
Adaptability or versatilityVSProductivity

Solution Approach 1:

The system performs preliminary verification by automatically checking layout patterns against design rules immediately after assignment. This preliminary action catches errors early in the design process, eliminating the need for time-consuming manual verification later, thereby maintaining design flexibility while improving productivity.

Inventive Principle:
Principle #10Preliminary action

Data Source

PatentUS11144704B2Layout checking system and method
Publication Date: 2021.10.12 TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD
  • US11144704B2 patent drawing
  • US11144704B2 patent drawing
  • US11144704B2 patent drawing

AI summary

A method includes operation below: extracting layout patterns that include interconnection layers between a first terminal and a second terminal coupled to the first terminal, in a layout design of a circuit; comparing a first portion of the layout patterns with a first coding portion that specifies a first layout constraint, in which the first portion of the layout patterns is extracted in a sequence starting from the first terminal or to the first terminal; comparing a second portion of the layout patterns with a second coding portion that specifies a second layout constraint, in which the second portion of the layout patterns is extracted in a sequence from the second terminal or to the second terminal; in response to comparisons, initiating fabrication of at least one element of the circuit according to the layout design.