Layout Data Decomposition Using Conflict Graph Analysis
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Solution Overview
Problem
Current microcircuit designs face challenges in manufacturing closely packed device components due to limitations in conventional mask writers, which struggle to resolve the pitch between closely spaced parallel conductive lines, necessitating the use of double patterning techniques to ensure minimum separation between adjacent structures.
Innovation Solution
The method involves analyzing layout design data to identify edges that should be imaged by separate lithographic masks, generating proposed cut paths, constructing a conflict graph, and selecting optimal cut paths to decompose polygons into segments, creating complementary mask patterns that satisfy separation directives while minimizing the number of polygon segments.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional mask writers are used to manufacture closely packed device components, then the manufacturing process is simple, but the pitch resolution between closely spaced parallel conductive lines cannot be achieved
Solution Approach 1:
The patent applies segmentation by dividing the layout design data into multiple decomposed sets, where each set contains a subset of geometric elements that can be manufactured separately. This allows the pitch resolution problem to be solved by creating multiple masks (first mask, second mask) that are applied in sequence, rather than attempting to manufacture all features in a single step. The decomposition process segments the original design into manageable portions that satisfy minimum separation requirements.
2Manufacturing precision
If double patterning techniques are used to ensure minimum separation between adjacent structures, then pitch resolution is improved, but the number of manufacturing steps increases
Solution Approach 1:
The patent applies preliminary action by performing the decomposition of layout design data before the actual manufacturing process. The system analyzes the original design, identifies geometric elements that require separation, and pre-divides them into decomposed sets with assigned mask identifiers. This preliminary decomposition allows the manufacturing process to proceed efficiently with predefined mask assignments, rather than requiring complex real-time decision-making during fabrication.
3Manufacturing precision
If layout design data is decomposed into multiple sets for double patterning, then pitch resolution is improved, but the complexity of data processing increases
Solution Approach 1:
The patent applies self-service by implementing an automated decomposition system that independently analyzes layout design data, identifies separation requirements, and generates decomposed sets with mask assignments without requiring manual intervention. The system uses algorithms to automatically detect geometric elements that need separation, determines optimal decomposition strategies, and produces the final decomposed data sets. This automation reduces the complexity burden on operators while maintaining high precision.
Data Source
AI summary
Techniques are disclosed for determining if the decomposition of layout design data is feasible, and for optimizing the segmentation of polygons in decomposable layout design data. Layout design data is analyzed to identify the edges of polygons that should be imaged by separate lithographic masks. In addition, proposed cut paths are generated to cut the polygons in the layout design data into a plurality of polygon segments. Once the separated edges and cut paths have been selected, a conflict graph is constructed that reflects these relationships. Next, a dual of the conflict graph is constructed. This dual graph will have a corresponding separation dual graph edge for each separated polygon edge pair in the layout design data. The dual graph also will have a corresponding cut path dual graph edge for each proposed cut path generated for the layout design data. After the dual graph has been constructed, it is analyzed to determine which of the proposed cut paths should be kept and which should be discarded. The layout design data is then modified to include the cut paths corresponding to the selected cut path dual graph edges. Alternately or additionally, separate sets of layout design data may be decomposed from original layout design data using the selected cut paths.