Semiconductor Layout Design Rule Access System

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Solution Overview

Problem

The complexity and increasing number of design rules for integrated circuit design make the current process time-consuming and inefficient, requiring circuit designers to repeatedly consult design rule manuals and query foundries, leading to multiple iterations before achieving a successful layout.

Innovation Solution

A system and method that allows direct access to custom design rules and a pattern library through a graphical user interface (GUI) during the design process, enabling designers to import and apply design features directly into the layout, thereby streamlining the design and verification process.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If designers consult design rule manuals and query foundries to understand design rules, then design rule compliance is achieved, but the design process becomes time-consuming and inefficient

Engineering Contradiction:
Improvedesign rule complianceVSAvoiddesign process time
Core Design Contradiction:
ReliabilityVSLoss of time

Solution Approach 1:

The patent introduces an intermediary system that acts as a bridge between designers and design rule information. This system automatically retrieves, interprets, and presents relevant design rules and foundry specifications to designers during the design process, eliminating the need for manual consultation of manuals and repeated queries to foundries while ensuring compliance.

Inventive Principle:
Principle #24Intermediary (Mediator)

Solution Approach 2:

The system implements feedback mechanisms that continuously monitor the design process and provide real-time information about design rule compliance. Designers receive immediate feedback when design elements violate rules, allowing for corrective action without waiting for manual review or post-design verification, thus reducing iteration cycles.

Inventive Principle:
Principle #23Feedback

2Manufacturing precision

If designers manually review design rules and perform iterative design checks, then design quality is improved, but productivity decreases due to multiple iterations

Engineering Contradiction:
Improvedesign qualityVSAvoiddesign throughput
Core Design Contradiction:
Manufacturing precisionVSProductivity

Solution Approach 1:

The system performs preliminary actions by pre-loading and pre-processing design rule information, foundry specifications, and compliance criteria before the designer begins work. This preparatory work includes organizing rules by relevance, pre-identifying potential compliance issues, and setting up automated checking mechanisms, so that designers can proceed with high-quality design without repeated manual review cycles.

Inventive Principle:
Principle #10Preliminary action

3Reliability

If comprehensive design rule manuals are consulted to ensure all rules are understood, then design compliance is improved, but the complexity of the design process increases

Engineering Contradiction:
Improvedesign rule complianceVSAvoiddesign process complexity
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The system applies local quality by providing design rule information selectively based on the specific context and stage of the design process. Rather than presenting all design rules uniformly, the system identifies which rules are relevant to the current design element being worked on and presents only those, reducing cognitive load while maintaining comprehensive compliance coverage.

Inventive Principle:
Principle #3Local quality

Data Source

PatentUS9047437B2Method, system and software for accessing design rules and library of design features while designing semiconductor device layout
Publication Date: 2015.06.02 TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD
  • US9047437B2 patent drawing
  • US9047437B2 patent drawing
  • US9047437B2 patent drawing

AI summary

Provided is a system and method for designing the layout of integrated circuits or other semiconductor devices while directly accessing design rules and a library of design features by interfacing with a GUI upon which the design layout is displayed. The design rules may be directly linked to the design features of the pattern library and imported into the device layout. The design rules may be directly accessed while designing the layout or while conducting a design rule check and the design features from the pattern library may be used in creating the layout.