Automated Layout Pattern Candidate Identification in Semiconductor Design

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Solution Overview

Problem

The complexity of semiconductor integrated circuits and the increasing difficulty in manufacturing smaller, denser components lead to performance issues that are challenging to analyze and correct, as existing methods lack efficient tools for identifying layout pattern candidates contributing to these problems.

Innovation Solution

A computer-implemented method for automatically identifying layout pattern candidates in selected regions by generating a reference baseline from designated regions, comparing frequency profiles, and ranking candidate patterns for further analysis, allowing for the identification of potential causes of performance issues.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If automated identification of layout pattern candidates is implemented, then analysis speed and objectivity improve, but system complexity increases

Engineering Contradiction:
Improveanalysis speedVSAvoidsystem complexity
Core Design Contradiction:
ProductivityVSDevice complexity

Solution Approach 1:

The analysis system is segmented into distinct functional modules: a reference baseline generation module that creates expected layout patterns from reference regions, a frequency profile comparison module that compares target regions against the baseline, and a candidate identification module that ranks potential issues. This modular segmentation enables automated high-speed analysis while keeping each module's complexity manageable and well-defined.

Inventive Principle:
Principle #1Segmentation

2Measurement precision

If frequency profile comparison is used to identify candidate patterns, then measurement precision improves, but computational requirements increase

Engineering Contradiction:
Improvepattern identification accuracyVSAvoidcomputational energy
Core Design Contradiction:
Measurement precisionVSUse of energy by moving object

Solution Approach 1:

The system performs frequency profile comparison at multiple levels of detail. It first compares overall frequency profiles to identify regions of interest, then performs more detailed pattern matching only in those identified regions. This partial action approach maintains high measurement precision for candidate identification while reducing total computational energy by avoiding exhaustive analysis of entire layouts.

Inventive Principle:
Principle #16Partial or excessive action

3Reliability

If automated analysis is applied to entire semiconductor layouts, then comprehensive coverage is achieved, but processing time increases

Engineering Contradiction:
Improveanalysis coverageVSAvoidprocessing time
Core Design Contradiction:
ReliabilityVSLoss of time

Solution Approach 1:

The semiconductor layout is divided into reference regions (used to establish baseline patterns) and target regions (subject to analysis). The automated analysis is applied selectively to target regions by comparing their frequency profiles against the reference baseline, achieving comprehensive coverage of critical areas without the prohibitive processing time required for entire layouts.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The system performs preliminary action by generating a reference baseline from reference regions before analyzing target regions. This baseline contains pre-computed frequency profiles of expected layout patterns, enabling rapid comparison and candidate identification in subsequent analysis without reprocessing reference data, thus reducing overall processing time while maintaining comprehensive coverage.

Inventive Principle:
Principle #10Preliminary action

Data Source

PatentUS9292650B2Identifying layout pattern candidates
Publication Date: 2016.03.22 SYNOPSYS INC
  • US9292650B2 patent drawing
  • US9292650B2 patent drawing
  • US9292650B2 patent drawing

AI summary

A method, system or computer usable program product for automatically identifying layout pattern candidates in selected regions for use in analyzing semiconductor device performance issues including identifying a set of target regions and a set of reference regions from a design layout; utilizing a processor to generate a reference baseline of layout patterns from the set of reference regions; utilizing the processor to compare a frequency profile of layout patterns in the set of target regions to a frequency profile of layout patterns in the reference baseline; and based on the comparison, utilizing the processor to identify candidate layout patterns from the set of target regions for further analysis.