LCD Column Spacer Movement Restriction via Projection Patterns

The patent forms projection patterns on the lower substrate before assembling the LCD device. These projection patterns are positioned to contact the column spacers when the upper substrate is pressed down, preventing spacer movement that would damage the alignment layer. This preliminary structural preparation resolves the contradiction by establishing protective features in advance.

The projection patterns act as intermediary structures between the external pressure and the column spacers. Instead of pressure directly moving the spacers and damaging the alignment layer, the projection patterns intervene by contacting the spacers first and preventing their displacement, thus protecting the alignment layer while still allowing cell gap maintenance.

Projection patterns are formed in advance on the lower substrate at specific positions where column spacers will be located. These projection patterns prevent spacer movement that causes alignment layer damage and subsequent light leakage, while still allowing the structure to distribute external pressure through the projection patterns themselves.

The patent converts the potentially harmful movement of column spacers under external pressure into a beneficial controlled interaction. The projection patterns guide the spacers to contact at specific points, transforming what would be damaging random movement into controlled, localized contact points that prevent light leakage while still distributing pressure.

The patent segments the aperture area into regions with different projection pattern densities. By dividing the aperture area and strategically placing projection patterns in specific zones, the alignment layer is protected in critical areas while maintaining large aperture areas for light transmission, thus resolving the contradiction between aperture size and protection.

Projection patterns are selectively placed in specific local regions where the alignment layer is most vulnerable to spacer movement. This local quality approach ensures that protection is provided exactly where needed, allowing the rest of the aperture area to remain maximized for display purposes without compromising overall alignment layer integrity.