Liquid Crystal Display Column Spacer Reflow Prevention
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Solution Overview
Problem
The existing process for forming a Black Column Spacer (BCS) in liquid crystal displays often results in deformation of the column spacer due to the reflow phenomenon during the bake process, making it difficult to maintain the desired height and configuration of the spacer.
Innovation Solution
A liquid crystal display structure is designed with a light blocking pattern that includes open portions spaced apart from the column spacer, allowing for a predetermined distance and a metal layer or gate wiring overlap, which helps prevent deformation by maintaining the spacer's shape during the bake process.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If the light blocking pattern and column spacer are integrally formed using the same material, then the processing time, mask cost, and photoresist consumption are reduced, but the column spacer deforms due to reflow during the bake process
Solution Approach 1:
The light blocking pattern is divided into multiple segments with different heights. The first light blocking pattern has a first height, the second light blocking pattern has a second height lower than the first height, and the third light blocking pattern has a third height lower than the second height. This segmentation prevents reflow between adjacent patterns during the bake process, maintaining the column spacer's shape while still using integral formation.
Solution Approach 2:
Different regions of the light blocking pattern are given different heights to create local variations in the structure. The first light blocking pattern region has a greater height than the second light blocking pattern region, which in turn is greater than the third light blocking pattern region. This local quality differentiation prevents reflow while maintaining the benefits of integral formation.
2Ease of manufacture
If the light blocking pattern and column spacer are integrally formed, then mask cost and photoresist consumption are reduced, but the column spacer height cannot be maintained due to reflow
Solution Approach 1:
The light blocking pattern is segmented into three distinct height levels (first, second, and third heights), where each segment is spaced apart from the column spacer by a predetermined distance. This segmentation prevents reflow during the bake process while maintaining integral formation, thus preserving both ease of manufacture and manufacturing precision.
Solution Approach 2:
The height parameter of the light blocking pattern is varied across different regions to create a stepped structure. By changing the height parameter locally rather than uniformly, the patent prevents reflow while maintaining the cost benefits of integral formation with a single mask and photoresist application.
3Device complexity
If a single light blocking pattern is used, then the structure is simpler, but it cannot prevent reflow of the column spacer during baking
Solution Approach 1:
The light blocking pattern is segmented into multiple height levels (first, second, and third heights) with each segment spaced from the column spacer by a predetermined distance. This segmentation approach maintains relative structural simplicity while effectively preventing reflow, thus improving column spacer stability without excessive complexity.
Solution Approach 2:
Instead of using multiple separate light blocking patterns in the planar dimension, the patent introduces a vertical dimension by creating segments at different heights. This dimensional approach prevents reflow while maintaining planar simplicity, as the segments are arranged vertically rather than requiring complex lateral arrangements.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution effectively suppresses the reflow of the column spacer, ensuring a predetermined step height and reducing processing time, mask cost, and photoresist consumption, while maintaining the desired configuration.
Implementation Method 1
the photoresist may reflow after the bake process is performed
Data Source
AI summary
A liquid crystal display (LCD) is provided. a liquid crystal display comprising: a first substrate and a second substrate that are opposite to each other; a liquid crystal layer arranged between the first substrate and the second substrate; a light blocking pattern including a first light blocking pattern and a second light blocking pattern arranged to extend along one direction on the first substrate; and a column spacer formed on the first light blocking pattern on the first substrate, wherein the light blocking pattern includes an open portion disposed between the first light blocking pattern and the second light blocking pattern, and formed to be spaced apart from the column spacer for a predetermined distance.