LCD Embossing Mold and Mask Integration

Resolve Bottlenecks,
Find Innovative Solutions
Generate Solutions

Solution Overview

Problem

The manufacturing process for transflective liquid crystal displays (LCDs) faces challenges in achieving good yield and reflectance of embossing patterns, which are complex to form using traditional slit masks.

Innovation Solution

A method involving the formation of an insulating substrate with a gate line and data line, followed by the creation of a TFT with a drain electrode, an organic passivation layer, and an embossing pattern using a mold with an intaglio pattern and projection, along with a unified mask for exposure and development, simplifies the process and enhances pattern quality.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If embossing patterns are formed using a slit mask, then the manufacturing process can be completed, but the yield and reflectance of embossing patterns are poor and the process becomes complex

Engineering Contradiction:
Improveembossing pattern qualityVSAvoidmanufacturing process complexity
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The patent combines the slit mask and mold into a unified integrated tool. The mold includes both the intaglio pattern for embossing and the slit mask portion for exposure, eliminating the need for separate mask and mold steps. This integration simplifies the manufacturing process while improving embossing pattern quality and yield.

Inventive Principle:
Principle #5Merging (Combining)

Solution Approach 2:

The unified mold serves multiple functions: it acts as both the embossing tool (creating the intaglio pattern) and the exposure mask (defining the pixel area). This multi-functional design reduces the number of manufacturing steps and tooling requirements while maintaining precise pattern formation.

Inventive Principle:
Principle #6Universality (Multi-functionality)

2Ease of manufacture

If a unified mold and mask are used, then the manufacturing process is simplified, but the mold structure becomes more complex

Engineering Contradiction:
Improvemanufacturing process simplicityVSAvoidmold structure complexity
Core Design Contradiction:
Ease of manufactureVSDevice complexity

Solution Approach 1:

The slit mask and mold are integrated into a single unified structure. The mold contains both the intaglio pattern for embossing and the slit mask portion for photolithography exposure. This integration eliminates the need for separate mask alignment and application steps, simplifying the overall manufacturing process despite the increased mold structure complexity.

Inventive Principle:
Principle #5Merging (Combining)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This method improves the yield and reflectance of embossing patterns, simplifying the manufacturing process and ensuring superior drain contact holes and pixel electrodes, thereby enhancing the overall performance of the LCD.

Implementation Method 1

forming an embossing pattern in the organic passivation layer by disposing and pressurizing a mold having an intaglio pattern corresponding to the pixel area and a projection corresponding to the drain electrode on the organic passivation layer

Methodology Applied
Scientific EffectPressurisation: Pressure Increase

Implementation Method 2

exposing and hardening the organic passivation layer by using the mold and the mask, which are unified

Methodology Applied
Scientific EffectPhotopolymerisation: Photopolymerisation

Data Source

PatentUS7817228B2Manufacturing method of an LCD comprising a mold and a mask
Publication Date: 2010.10.19 SAMSUNG DISPLAY CO LTD
  • US7817228B2 patent drawing
  • US7817228B2 patent drawing
  • US7817228B2 patent drawing

AI summary

A manufacturing method of an LCD comprises forming an insulating substrate; forming a gate line extending in a horizontal direction and a data line insulatively crossing the gate line to define a pixel area on the insulating substrate; forming a TFT disposed at an intersection of the gate line and the data line and comprising a drain electrode; forming an organic passivation layer on the TFT; forming a drain contact hole exposing the drain electrode and forming an embossing pattern in the organic passivation layer by disposing and pressurizing a mold having an intaglio pattern corresponding to the pixel area and a projection corresponding to the drain electrode on the organic passivation layer; and forming a pixel electrode connected to the drain electrode through the drain contact hole.