Direct Writing Exposure Light Correction for LCD Line Width
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Solution Overview
Problem
Liquid crystal display devices suffer from periodic unevenness in image quality due to irregularities in the line width of pixel and common electrodes, which are caused by the limited exposure area of direct-writing-exposure-type exposure devices, leading to fluctuations in light quantity and brightness.
Innovation Solution
The method involves dividing the exposure area into smaller regions and using spatial optical modulating elements like DMDs to correct light quantity distribution, ensuring that the fluctuation in basic pattern size is minimized to less than 0.2 μm, and employing Fourier analysis to adjust light intensity, thereby reducing periodic irregularities in electrode sizes and improving image quality.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a direct-writing-exposure-type exposure device is used to expose the photosensitive material film, then the line width irregularity of pixel electrodes and common electrodes is reduced, but the exposure area is limited and scanning is required, causing time consumption and potential periodic unevenness in image quality
Solution Approach 1:
The exposure area is divided into multiple small regions that are exposed sequentially through scanning. This segmentation allows the direct-writing-exposure-type device to cover the entire large-area photosensitive material film while maintaining precise line width control in each small region, thereby reducing overall line width irregularity despite the time-consuming scanning process
Solution Approach 2:
The light quantity distribution is dynamically adjusted during the exposure process based on the position being exposed. By changing exposure parameters (light intensity, exposure duration) according to location, the method compensates for variations in the scanning process and prevents periodic unevenness in image quality, maintaining high manufacturing precision across the entire exposure area
2Manufacturing precision
If the exposure area is divided into small regions and scanned, then line width irregularity is reduced, but periodic unevenness in image quality may occur due to light quantity fluctuations
Solution Approach 1:
The system incorporates feedback control by monitoring the light quantity distribution during scanning and adjusting exposure parameters in real-time. This feedback mechanism detects and compensates for light quantity fluctuations that would otherwise cause periodic unevenness, ensuring both line width uniformity and image quality reliability across the entire display device
Solution Approach 2:
Exposure parameters such as light intensity and exposure duration are dynamically changed based on the scanning position and detected light quantity variations. This adaptive parameter adjustment ensures consistent exposure results across all small regions, preventing periodic unevenness while maintaining high line width uniformity
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach effectively reduces periodic unevenness in image quality by minimizing the fluctuation in line width and brightness, enhancing the uniformity of the liquid crystal display device's performance across larger areas.
Implementation Method 1
a direct writing exposure device of a type which performs numerical control of a spatial optical modulating element and forms a pattern of light to be radiated to a photosensitive material film by the numerical control of the spatial optical modulating element
Implementation Method 2
a method for manufacturing a display device which reduces periodic unevenness in image quality in a liquid crystal display device by correcting a light quantity distribution, comprises the step of forming a preset basic pattern in a plurality of places on an insulation substrate by exposing and developing a photosensitive material film
Data Source
AI summary
A method for manufacturing a display device includes the step of forming a preset basic pattern in a plurality of places on an insulation substrate by exposing and developing a photosensitive material film which is formed on the insulation substrate, wherein the exposure is performed using a direct writing exposure device. The exposure is performed using the direct writing exposure device in which the light quantity distribution of the pattern of light formed by the spatial optical modulating element is corrected such that a fluctuation quantity of a size of the basic pattern formed in the plurality of places becomes not more than 0.2 μm.