Photoresist Stripper Composition for LCD Metal Wire Corrosion
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Solution Overview
Problem
Current photoresist stripper compositions for LCD manufacturing face challenges in effectively removing degenerated photoresist after hard baked and dry etch processes, particularly for copper and aluminum wires, due to corrosion issues and incomplete stripping, and require specialized corrosion inhibitors for different metal types.
Innovation Solution
A photoresist stripper composition incorporating a transition metal corrosion inhibitor such as mercaptomethylimidazole, a potential metal and metal oxide corrosion inhibitor like monoammonium phosphate, primary alkanolamine, cyclic alcohol, and protic polar organic solvents, which maintains effective corrosion inhibition and stripping ability across varying water content and process conditions.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Quantity of substance
If water is added to alkanolamine-based photoresist stripper, then washing ability is improved, but metal wire corrosion increases due to hydroxide ion production
Solution Approach 1:
A corrosion inhibitor is introduced as an intermediary substance that mediates between the hydroxide ions (harmful) and metal wires (protected). The corrosion inhibitor molecules adsorb onto metal surfaces, forming a protective barrier that prevents hydroxide ions from attacking the metal, thus enabling water to be added without causing corrosion.
Solution Approach 2:
The harmful hydroxide ions produced by alkanolamine-water mixing are converted into a beneficial effect through the corrosion inhibitor. The inhibitor utilizes the presence of hydroxide ions to form protective corrosion product layers on metal surfaces, transforming the corrosive environment into a protective one.
2Object-affected harmful factors
If weak basic amine is used in photoresist stripper, then metal wire corrosion is reduced, but degenerated photoresist removal ability deteriorates after hard baked and dry etch processes
Solution Approach 1:
The photoresist stripper uses a composite formulation combining weak basic amine (for corrosion protection) with strong base (for effective photoresist removal) and corrosion inhibitor (for enhanced protection). This composite system achieves both low corrosion and high stripping efficiency that neither component could achieve alone.
Solution Approach 2:
The patent changes the chemical composition parameters of the stripper by adding strong base and corrosion inhibitor to the weak basic amine system. This parameter modification enables the system to overcome the inherent limitation of weak basic amines (insufficient stripping power) while maintaining their corrosion protection advantage.
3Object-affected harmful factors
If secondary alkanolamines are used for copper wire film stripping, then corrosion resistance is improved, but a separate corrosion inhibitor is still required
Solution Approach 1:
The corrosion inhibitor used in the patent provides universal protection for multiple metal types (aluminum, copper, and their oxides) simultaneously. This multi-functional approach eliminates the need for separate corrosion inhibitors for different metals, simplifying the formulation while providing comprehensive corrosion protection across all metal wire films.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition ensures excellent anticorrosion and stripping performance for copper, aluminum, and oxide metal wires, even after advanced processing stages, with stable corrosion inhibition and efficient photoresist removal, suitable for both aqueous and organic stripper applications.
Implementation Method 1
a transition metal and potential metal corrosion inhibitor which forms a protective film on the metal surface
Implementation Method 2
a transition metal and potential metal corrosion inhibitor of Chemical Formula 1 and Chemical Formula 2
Implementation Method 3
a primary amine, a secondary amine or a tertiary amine... (c) a primary alkanolamine in 1% by weight to 20% by weight
Data Source
AI summary
The present disclosure relates to a photoresist stripper composition for manufacturing an LCD, and relates to an integrated photoresist stripper composition capable of being used in all processes for manufacturing a TFT-LCD. More specifically, the present disclosure relates to an aqueous photoresist stripper composition capable of being used in all of transition metal, potential metal and oxide semiconductor wires. The aqueous photoresist stripper composition includes (a) a potential metal and metal oxide corrosion inhibitor, (b) a transition metal corrosion inhibitor, (c) a primary alkanolamine, (d) a cyclic alcohol, (e) water, (f) an aprotic polar organic solvent, and (g) a protic polar organic solvent, and has an excellent ability to remove a degenerated photoresist produced after progressing a hard baked process, an implant process and a dry etch process in a semiconductor or flat display panel process, may be used in aluminum that is a potential metal, copper or silver that is a transition metal, and metal oxide wires at the same time, and may be introduced to organic film and COA processes.